Sakai Akira | Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
スポンサーリンク
概要
- Sakai Akiraの詳細を見る
- 同名の論文著者
- Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japanの論文著者
関連著者
-
SAKAI Akira
Graduate School of Engineering, Nagoya University
-
Sakai Akira
Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
-
Sakai Akira
Graduate School of Engineering Science, Osaka University, 1-3 Machikane-cho, Toyonaka, Osaka 560-8531, Japan
-
Zaima Shigeaki
Graduate School Of Eng. Nagoya Univ.
-
Zaima S
Nagoya Univ. Nagoya Jpn
-
Ogawa Masaki
Ecotopia Science Institute Nagoya University
-
酒井 彰
室蘭工大工
-
Sakai A
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
-
Sakai A
Division Of Electrical And Computer Engineering Yokohama National University
-
Sakashita Mitsuo
Graduate School of Eng., Nagoya Univ.
-
ZAIMA Shigeaki
Graduate School of Engineering, Nagoya University
-
OGAWA Masaki
EcoTopia Science Institute, Nagoya University
-
Okada Masahisa
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
-
Zaima Shigeaki
Graduate School Of Engineering Nagoya University
-
SAKASHITA Mitsuo
Graduate School of Engineering, Nagoya University
-
Sakashita M
Graduate School Of Engineering Nagoya University
-
Yasuda Y
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
-
YASUDA Yukio
Graduate School of Engineering, Nagoya University
-
KONDO Hiroki
Graduate School of Engineering, Nagoya University
-
OGAWA Masaki
Center for Cooperative Research in Advanced Science & Technology, Nagoya University
-
Yasuda Yukio
Shionogi Research Laboratories Shionogi & Co. Ltd.
-
Nakatsuka Osamu
Graduate School of Eng., Nagoya Univ.
-
Zaima Shigeaki
Center For Cooperative Research In Advanced Science & Technology Nagoya University
-
Nakatsuka O
Graduate School Of Engineering Nagoya University
-
酒井 明
京大工
-
ZAIMA Shigeaki
Center for Cooperative Research in Advanced Science and Technology, Nagoya University
-
IKEDA Hiroya
Graduate School of Engineering, Nagoya University
-
近藤 博基
名古屋大学大学院工学研究科
-
Kondo H
Department Of Biochemical Engineering And Science Kyushu Institute Of Technology
-
Nakatsuka Osamu
Center For Integrated Research In Science And Engineering Nagoya University
-
SAGO Toshifumi
Graduate School of Engineering, Nagoya University
-
SEKO Akiyoshi
Graduate School of Engineering, Nagoya University
-
Kondo Hideo
Institute Of Advanced Material Study Graduate School Of Engineering Sciences And Crest Japan Science
-
Seko Akiyoshi
Graduate School Of Engineering Nagoya University
-
Kondo Hirotomo
Department Of Applied Chemistry Faculty Of Engineering Sojo University
-
Kondo H
Department Of Applied Chemistry Faculty Of Engineering Sojo University
-
Sago Toshifumi
Graduate School Of Engineering Nagoya University
-
Sakai Akira
Mesoscopic Materials Research Center Faculty Of Engineering Kyoto University
-
Nakatsuka Osamu
Graduate School Of Engineering Nagoya University
-
Izunome Koji
Covalent Materials Corporation, 6-861-5 Higashi-ko, Seiro, Kitakanbara, Niigata 957-0197, Japan
-
Isogai Hiromichi
Covalent Materials Corporation, Seiro, Niigata 957-0197, Japan
-
Toyoda Eiji
Covalent Silicon Co., Ltd., Seiro, Niigata 957-0197, Japan
-
Toyoda Eiji
Covalent Materials Corporation, Seiro, Niigata 957-0197, Japan
-
OGAWA Masaki
CCRAST, Nagoya University
-
TSUCHIYA Yoshinori
Graduate School of Engineering, Nagoya University
-
NAKATSUKA Osamu
Graduate School of Engineering, Nagoya University
-
Tobioka Akihiro
Graduate School Of Engineering Nagoya University
-
Ikeda H
National Laboratory For High Energy Physics
-
Tsuchiya Y
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
-
Furumai Kouhei
Graduate School Of Engineering Nagoya University
-
Tsuchiya Yoshinori
Graduate School Of Comprehensive Human Sciences University Of Tsukuba
-
Senda Takeshi
Covalent Materials Corporation, Seiro, Niigata 957-0197, Japan
-
Senda Takeshi
Covalent Materials Corporation, 6-861-5 Higashi-ko, Seiro, Kitakanbara, Niigata 957-0197, Japan
-
FUJITSUKA Ryota
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
-
FUJITSUKA Ryota
Graduate School of Engineering, Nagoya University
-
YASUDA Yukio
Kochi University of Technology
-
WATANABE Yukihiko
Toyota Central R&D Labs., Inc.
-
NAKATSUKA Osamu
Center for Integrated Research in Science and Engineering, Nagoya University
-
TOBIOKA Akihiro
Graduate School of Engineering, Nagoya University
-
SUZUKI Atsushi
Graduate School of Engineering, Nagoya University
-
AKIMOTO Shingo
Graduate School of Engineering, Nagoya University
-
KITO Nobuyuki
Graduate School of Engineering, Nagoya University
-
Kito Nobuyuki
Graduate School Of Engineering Nagoya University
-
FURUMAI Kouhei
Graduate School of Engineering, Nagoya University
-
OGAWA Masaki
Nagoya University, Ecotopia Science Institute
-
ARIYOSHI Keiko
Graduate School of Engineering, Nagoya University
-
Takahashi Ryoya
Graduate School Of Engineering Nagoya University
-
Watanabe Yukihiko
Toyota Central R&d Labs. Inc.
-
Suzuki Atsushi
Graduate School Of Agricultural Science Tohoku University
-
Fujitsuka Ryota
Graduate School Of Engineering Nagoya University
-
Ariyoshi Keiko
Graduate School Of Engineering Nagoya University
-
Akimoto Shingo
Graduate School Of Engineering Nagoya University
-
Nakamura Yoshiaki
Graduate School Of Engineering Hokkaido University
-
Kobayashi Yasushi
Graduate School Of Engineering Nagoya University
-
Suzuki Atsushi
Graduate School Of Engineering Nagoya University
-
Kikkawa Jun
Graduate School Of Engineering Science Osaka University
-
Shimura Yosuke
Graduate School Of Engineering Nagoya University
-
Izunome Koji
Covalent Silicon Co., Ltd., Seiro, Niigata 957-0197, Japan
-
Isogai Hiromichi
Covalent Silicon Co., Ltd., Seiro, Niigata 957-0197, Japan
-
Yoshitake Osamu
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
-
Omote Kazuhiko
Rigaku Corp., Akishima, Tokyo 196-8666, Japan
-
Kobayashi Yasushi
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Nakatsuka Osamu
Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
-
Nakatsuka Osamu
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Nakatsuka Osamu
Center for Integrated Research in Science and Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Kikkawa Jun
Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
-
Zaima Shigeaki
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Kaneko Yukihiro
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Ikeno Daisuke
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Zaima Shigeaki
Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
-
Tsutsui Norimasa
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Shimura Yosuke
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Sakashita Mitsuo
Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
-
Takahashi Ryoya
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
Sakai Akira
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
著作論文
- Invited Strain Engineering for SiGe Buffer Layers for High-Mobility Si Channels (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Electrical Properties and Solid-Phase Reactions in Ni/Si(100) Contacts
- Dependence of Electrical Characteristics on Interfacial Structures of Epitaxial NiSi_2/Si Schottky Contacts Formed from Ni/Ti/Si System
- Pr-Oxide-Based Dielectric Films on Ge Substrates
- Behavior of Local Charge Trapping Sites in La_2O_3-Al_2O_3 Composite Films under Constant Voltage Stress
- Local Current Leakage Characterization in La_2O_3-Al_2O_3 Composite Films by Conductive Atomic Force Microscopy
- Nanoscale Observations for Degradation Phenomena in SiO_2 and High-k Gate Insulators Using Conductive-Atomic Force Microscopy
- Crystalline and electrical properties of mictamict TiSiN gate MOS capacitors
- Film structures and electrical properties of Pr silicate formed by pulsed laser deposition
- Invited Strain Engineering for SiGe Buffer Layers for High-Mobility Si Channels (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Thermal Stability and Electrical Properties of (La_2O_3)_(Al_2O_3)_x Composite Films
- Electrical Properties and Solid-Phase Reactions in Ni/Si(100) Contacts
- Annealing Effects on Ge/SiO2 Interface Structure in Wafer-Bonded Germanium-on-Insulator Substrates
- Mechanical Properties and Chemical Reactions at the Directly Bonded Si–Si Interface
- Crystalline and Electrical Properties of Mictamict TiSiN Gate Metal–Oxcide–Semiconductor Capacitors
- Characterization and Analyses of Interface Structures in Directly Bonded Si(011)/Si(001) Substrates
- Scanning Tunneling Microscopy of Initial Nitridation Processes on Oxidized Si(100) Surface with Radical Nitrogen
- Composition Dependence of Work Function in Metal (Ni,Pt)–Germanide Gate Electrodes
- Control of Sn Precipitation and Strain Relaxation in Compositionally Step-Graded Ge1-xSnx Buffer Layers for Tensile-Strained Ge Layers