Fabrication of a Field Emitter Array with a Built-in Einzel Lens
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概要
- 論文の詳細を見る
A field emitter array (FEA) with four stacked gate electrodes, that is, FEA with a built-in einzel lens, was fabricated using an etch-back technique. In our method, gate hole opening is a self-aligned process; therefore, the axes of electrode holes are well aligned without precise lithography. Emitter tip opening is also a unique process: the tip opening is usually carried out using buffered hydrofluoric (BHF) acid to prevent tip damage. However, in the case of the FEA with a multistacked electrode, BHF etching produces a long undercut under the electrode, particularly under the upper electrode. In our process, the upper lens electrode is used as a photolithography mask when etching silicon dioxide in order to prevent excess undercut. In this paper, the details of fabrication are described.
- 2009-06-25
著者
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YOSHIDA Tomoya
National Institute of Advanced Industrial Science and Technology
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KANEMARU Seigo
National Institute of Advanced Industrial Science and Technology
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Mimura Hidenori
Research Institute Of Electrical Commnication Tohoku University
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Neo Yoichiro
Reseach Institute Of Electrical Communication Tohoku University
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Nagao Masayoshi
National Institute of Advanced Industrial Science & Technology (AIST)
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Nagao Masayoshi
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Neo Yoichiro
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
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Kanemaru Seigo
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kanemaru Seigo
National Institute of Advanced Industrial Science & Technology (AIST)
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Yoshida Tomoya
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Mimura Hidenori
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
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Mimura Hidenori
Reseach Institute of Electrical Communication, Tohoku University,
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