Hydrogen Termination and Optical Properties of Porous Silicon : Photochemical Etching Effect
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
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Kanemitsu Yoshihiko
Institute Of Physics University Of Tsukuba
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Kanemitsu Yoshihiko
The Institute For Solid State Physics The University Of Tokyo
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Kanemitsu Yoshihiko
The Institute For Solid State Physics The University Of Tokyo:(present Address) Department Of Image
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Matsumoto T
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Kanemitsu Y
Nara Inst. Sci. And Technol. Nara Jpn
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Kanemitsu Y
Department Of Image Science And Technology Faculty Of Engineering Chiba University
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Kanemitsu Yoshihiko
Institute For Chemical Research Kyoto University
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MATSUMOTO Takahiro
Electronics Research Laboratories, Nippon Steel Corporation
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MIMURA Hidenori
Electronics Research Laboratories, Nippon Steel Corporation
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FUTAGI Toshiro
Electronics Research Laboratories, Nippon Steel Corporation
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Matsumoto Takuya
Institute Of Scientific And Industrial Reserch Univ Of Osaka
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Mimura Hidenori
Electronics Research Laboratories Nippon Steel Corporation
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Mimura Hidenori
Research Institute Of Electrical Commnication Tohoku University
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Mimura Hidenori
Graduate School Of Electric Science And Technology Shizuoka University
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Matsumoto Takahiro
Electronics Research Laboratories Nippon Steel Corporation
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Futagi T
Nippon Steel Corp. Kanagawa Jpn
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Mimura H
Shizuoka University
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Mimura Hidenori
Electronics Reseach Laboratories Nippon Steel Corporation
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Matsumoto Takuya
Isir Osaka Univ.
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MIMURA Hidenori
Electronics R&D Laboratories, Nippon Steel Corporation
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FUTAGI Toshiro
Electronics R&D Laboratories, Nippon Steel Corporation
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