Fabrication and Characteristics of Sputter-Induced Carbon Nanoneedle Field Emitters and Si Electron-Transparent Films for Application to Electron-Beam-Pumped Light Sources
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概要
- 論文の詳細を見る
We have fabricated novel sputter-induced carbon nanoneedle field emitters and Si electron-transparent films for application to electron-beam-pumped light sources. The sputter-induced carbon nanoneedle field emitters exhibited a stable electron emission of 0.1 mA at an average field of 13 V/μm. The 1.5-μm-thick Si electron-transparent films achieved an electron transmittance of about 60% at an acceleration voltage of 27 kV. We also demonstrated an electron-beam-pumped light source realized by the excitation of N2 gas, and clearly observed an N2 gas spectrum with a peak at 337 nm.
- Japan Society of Applied Physicsの論文
- 2006-10-25
著者
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Okada Morihiro
Research Institute Of Electronics Shizuoka University
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IKEDO Tomoyuki
Ikedo Electric Limited
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TAKAHASHI Masafumi
Faculty of Engineering, Kagawa University
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Neo Yoichiro
Reseach Institute Of Electrical Communication Tohoku University
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Hashiguchi Gen
Faculty Of Engineering Kagawa University
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Shiozawa Kazufumi
Research Institute Of Electronics Shizuoka University
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Hashiguchi Gen
Faculty of Engineering, Kagawa University, Takamatsu 761-0396, Japan
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Neo Yoichiro
Research Institute of Electronics, Shizuoka University, Hamamatsu, Shizuoka 432-8011, Japan
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Okada Morihiro
Research Institute of Electronics, Shizuoka University, Hamamatsu, Shizuoka 432-8011, Japan
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Mimura Hidenori
Research Institute of Electronics, Shizuoka University, Hamamatsu, Shizuoka 432-8011, Japan
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Mimura Hidenori
Reseach Institute of Electrical Communication, Tohoku University,
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