Radical-Beam-Induced Surface Reaction Processes of Porous Si
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-30
著者
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KOMURO Shuji
Faculty of Engineering, Toyo University
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Komuro Shuji
Faculty Of Engineering Toyo University
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Aoyagi Yoshinobu
Riren (the Institute Of Physical And Chemical Research)
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Morikawa T
Toyo Univ. Saitama Jpn
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Morikawa T
Communications Res. Lab. Tokyo Jpn
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Morikawa Takitaro
Faculty Of Engineering Toyo University
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Aoyagi Y
Semiconductor Laboratory Riken The Institute For Physical And Chemical Research
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Aoyagi Y
Riren (the Institute Of Physical And Chemical Research)
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Aoyagi Y
The Institute Of Physical And Chemical Research
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KATO Takashi
Faculty of Engineering, Toyo University
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Morikawa Takeshi
Toyota Central R & D Laboratories Inc.
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Aoyagi Yoshinobu
Frontier Research Program Riken
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Aoyagi Yoshinobu
The Institute Of Physical And Chemical Research (riken):microelectronics R & D Center Chinese Ac
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0'keeffe Patrick
Riren (the Institute Of Physical And Chemical Research)
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Aoyagi Y
Inst. Physical And Chemical Res. Riken Wako Jpn
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Kato T
Ryukyu Univ. Okinawa Jpn
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