Chemical Etching of High-T_c Superconducting Films in Feliox-115 Solution : Electrical Properties of Condensed Matter
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概要
- 論文の詳細を見る
A new chemical etching technique of high-T_c superconducting Y-Ba-Cu-O and Er-Ba-Cu-O films has been developed by employing a novel etchant Feliox-115. It offered a diffusion-limited etching. The rate (at 20℃) and the activation energy of Y-Ba-Cu-O dissolution were, respectively, 0.5μm/min and 0.32 eV. The Er compound was etched off more preferentially than the Y one: The etching rate of the former was nearly twice as high as the latter. The degradation of T_c induced during this process was at most 4 K.
- 社団法人応用物理学会の論文
- 1988-01-20
著者
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KOBAYASHI Takeshi
Faculty of Engineering Science, Osaka University
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SAKAGUCHI Yoshiyuki
Faculty of Engineering Science, Osaka University
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TONOUCHI Masayoshi
Faculty of Engineering Science, Osaka University
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Sakaguchi Y
Graduate School Of Information Systems The University Of Electro-communications
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Sakaguchi Yoshiyuki
Faculty Of Engineering Science Osaka University
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Kobayashi Takeshi
Faculty Of Engineering Science Department Of Electrical Engineering Osaka University
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