Chemical Etching of High-T_c Superconducting Y-Ba-Cu-O Films in Phosphoric Acid Solution
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概要
- 論文の詳細を見る
Chemical etching properties of a high-T_c Y-Ba-Cu-O film with a phosphoric acid (H_3PO_4) solution were closely investigated. With an appropriate stirring, the etching developed in proportion to the time. The etching rate R was dependent on the dilution γ of H_3PO_4:R (μm/s)〓2γ for γ〓0.5, and otherwise it decreased superlinearly with increasing γ. A 2 μm wide Y-Ba-Cu-O line was fabricated using this technique with a positive-type photoresist such as AZ-1350J. Nosign of degradation of the superconductivity was found in the 50 μm wide etched lines. Rather, they showed an extreme enhancement of the onset temperature after this procedure.
- 社団法人応用物理学会の論文
- 1987-09-20
著者
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KOBAYASHI Takeshi
Faculty of Engineering Science, Osaka University
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TONOUCHI Masayoshi
Faculty of Engineering Science, Osaka University
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YOSHIZAKO Yuji
Faculty of Engineering Science, Osaka University
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YOSHIZAKO Yuji
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Yoshizako Yuji
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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Kobayashi Takeshi
Faculty Of Engineering Science Department Of Electrical Engineering Osaka University
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