Influence of H_2O on the SiO_2 Growth by Parallel-Resonant RF Plasma Oxidation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-07-15

著者

• Suzuki M

  Shizuoka Univ. Hamamatsu

• Kitagawa A

  Kanazawa Univ. Kanazawa Jpn

• Kitagawa Akio

  Department Of Electrical & Computer Engineering Faculty Of Technology Kanazawa University

• Kitagawa Akio

  Department Of Electrical And Computer Engineering Faculty Of Engineering Kanazawa University

• SUZUKI Masakuni

  Department of Obstetrics and Gynecology, Tohoku University School of Medicine

• Takeuchi M

  Nagoya Univ. Nagoya Jpn

• TAKEUCHI Masaki

  Department of Applied Chemistry, Faculty of Engineering, Kanagawa University

• Suzuki Mariko

  Advanced Semiconductor Devices Research Laboratories R&d Center Toshiba Corporation

• Takeuchi Manabu

  Department Of Electrical And Electronic Engineering Ibaraki University

• Suzuki M

  Department Of Electronics Graduate School Of Engineering Tohoku University

• SHIBATA Yoshitake

  Department of Electrical & Computer Engineering, Faculty of Technology, Kanazawa University

• Suzuki Masakuni

  Department Of Obstetrics And Gynecology Tohoku University School Of Medicine

• Takeuchi Masaki

  Department Of Applied Chemistry Faculty Of Engineering Kanagawa University

• Suzuki Masakuni

  Department Of Electrical And Computer Engineering Faculty Of Technology Kanazawa University

• Shibata Yoshitake

  Department Of Electrical & Computer Engineering Faculty Of Technology Kanazawa University

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