Dual Jet Ionizer for Manufacturing Semiconductor Devices

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概要

• 論文の詳細を見る

• The corona discharge air ionizer is one of the most important equipment for controlling electrostatic charges in the manufacture of semiconductor devices. However, the conventional air ionizer generates various kinds of contaminations, including particles. The dual jet ionizer that has a jet emitter in a nozzle has been proposed for reducing contamination from an emitter. Ions are generated in a nitrogen atmosphere in the dual jet ionizer because of nitrogen gas flow in both the emitter and the nozzle. The characteristics of ion generation and ozone generation were investigated for both the dual jet ionizer and the non-jet air ionizer. The characteristics of the dual jet ionizer depended strongly on the flow rates of nitrogen gas in the emitter and the nozzle. The number of particles generated by the dual jet ionizer under the optimum operating conditions was approximately four times smaller than that by the non-jet air ionizer.

• 社団法人 電気学会の論文
• 2005-12-01

著者

• Okano K

  Eisai Co. Ltd. Ibaraki Jpn

• Okano Kazuo

  Department Of Electrical System Engineering Polytechnic University

• TAKEUCHI Manabu

  Department of Electrical and Electronic Engineering, Ibaraki University

• Takeuchi Manabu

  Department Of Electrical And Electronic Engineering Ibaraki University

• IMAZONO Hiroyuki

  Graduate School of Science and Engineering, Ibaraki University

• KUSAKARI Satoshi

  Department of Electrical Engineering, The Polytechnic University

• Imazono Hiroyuki

  Graduate School Of Science And Engineering Ibaraki University

• Kusakari Satoshi

  Department Of Electrical Engineering The Polytechnic University

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