Low Temperature Chemical Vapor Deposition of (Ba, Sr)TiO_3 Thin Films for High Density Dynamic Random Access Memory Capacitors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-02-15
著者
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Roh J‐s
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Roh J
Memory Research And Development Division Hynix Semiconductor Inc.
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Roh Jae-sung
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Lee K‐s
Lg Siltron Inc. Kyungbuk Kor
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Kim Jung-jin
Research Center For Interdisciplinary Research Tohoku University
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JOO Jae-Hyun
Process Group, Advanced Technology Laboratory, LG Semicon
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ROH Jae-Sung
Process Group, Advanced Technology Laboratory, LG Semicon
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KIM Jae-Jeong
Process Group, Advanced Technology Laboratory, LG Semicon
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Lee Kong-soo
Process Team R&d Division Lg Semicon Co Ltd.
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PARK Jong-Bum
Process team, R&D division, LG Semicon Co, Ltd.
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KIM Younsoo
Process team, R&D division, LG Semicon Co, Ltd.
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LEE Jun-Sik
Process team, R&D division, LG Semicon Co, Ltd.
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Kim Jae-jeong
Process Team R&d Division Lg Semicon Co Ltd.
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Kim Y
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Lee J‐s
Kyungpook National Univ. Taegu Kor
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Roh J‐s
Memory Research And Development Division Hynix Semiconductor Inc.
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Joo Jae-hyun
Process Team R&d Division Lg Semicon Co Ltd.
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Park Jong-bum
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Lee Jun-sik
Process Team R&d Division Lg Semicon Co Ltd.
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Joo Jae-hyun
Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.
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Lee Kong-soo
Process Development Team Memory Division Samsung Electronics Co. Ltd.
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Park Jong-Bum
Process team, R&D division, LG Semicon Co, Ltd.
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Kim Younsoo
Process team, R&D division, LG Semicon Co, Ltd.
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