P and As Implantation Enhanced Formation of Metal-Free Oxide on WSi_2
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-12-15
著者
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Roh Jae-sung
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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KIM Ji-Young
Department of Life Science, College of Natural Sciences, Chung-Ang University
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Kim Ji-young
Department Of Metallurgical Engineering Kookmin University
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LEE Jeong-Yong
Department of Materials Science and Engineering, Korea Advanced Institute of Sciencc and Technology
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Roh J‐s
Hynix Semiconductor Inc. Inchon Kor
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LEE Jae-Gab
Department of Metallurgical Engineering, Kookmin University
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ROH Jae-Sung
LG Semicon Co., Ltd.
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HUH Jeung-Soo
Department of Metallurgical Engineering, Kyungpook National University
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Roh Jae-sung
Lg Semicon Co. Ltd.
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Lee Jae-gab
Department Of Metallurgical Engineering Kookmin University
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Huh Jeung-soo
Department Of Metallurgical Engineering Kyungpook National University
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Lee Jeong-yong
Department Of Electronic Materials And Engineering Kaist
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Kim Ji-young
Department Of Environmental Engineering Kumoh National Institute Of Technology
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HUH Jeung-Soo
Department of Materials Science and Metallurgy, Kyungpook National University
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