Effect of Oxygen Ion Energy and Annealing in Formation of Tin Oxide Thin Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-04-15
著者
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Cho Jun-sik
School Of Materials Science And Engineering Yonsei University
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Choi W‐k
Thin Film Technology Research Center Korea Institute Of Science And Technology
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KOH Seok-Keun
Thin Film Technology Research Center Korea Institute of Science and Technology
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SONG Seok-Kyun
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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CHOI Won-Kook
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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CHO Jun-Sik
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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JUNG Hyung-Jin
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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CHOI Dongsoo
R&D Center, Korea Gas Corporation
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LEE Jeong-Yong
Department of Materials Science and Engineering, Korea Advanced Institute of Sciencc and Technology
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BAIK Hong-Koo
Department of Metallurgical Engineering, Yonsei University
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KOH Seok-Keun
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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Baik Hong-koo
Department Of Metallurgical System Engineering Yonsei University
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SONG Seok-Kyun
UION Corporation
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Lee J‐y
Korea Advanced Inst. Sci. And Technol. Daejon Kor
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Jung H‐j
Thin Film Technology Research Center Korea Institute Of Science And Technology
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Baik Hong-koo
Department Of Metallurgical Engineering College Of Engineering Yonsei University
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Choi Dongsoo
R&d Center Korea Gas Corporation
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Koh S‐k
Thin Film Research Center Korea Institute Of Science And Technology
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Jung Hyung-jin
Division Of Ceramics Korea Institute Of Science And Technology
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Lee Jeong-yong
Department Of Electronic Materials And Engineering Kaist
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Song Seok-kyun
Division Of Ceramics Korea Institute Of Science And Technology Cheongryang
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