Auger Electron and X-Ray Photoelectron Spectroscopy Studies of Oxidation of Tin Using SnO_x Thin Films Grown by Reactive Ion-Assisted Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-11-15
著者
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Cho Jun-sik
School Of Materials Science And Engineering Yonsei University
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Choi W‐k
Thin Film Technology Research Center Korea Institute Of Science And Technology
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KOH Seok-Keun
Thin Film Technology Research Center Korea Institute of Science and Technology
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SONG Seok-Kyun
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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CHOI Won-Kook
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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CHO Jun-Sik
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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JUNG Hyung-Jin
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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KOH Seok-Keun
Division of Ceramics, Korea Institute of Science and Technology, Cheongryang
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SONG Seok-Kyun
UION Corporation
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Jung H‐j
Thin Film Technology Research Center Korea Institute Of Science And Technology
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Koh S‐k
Thin Film Research Center Korea Institute Of Science And Technology
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Jung Hyung-jin
Division Of Ceramics Korea Institute Of Science And Technology
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Song Seok-kyun
Division Of Ceramics Korea Institute Of Science And Technology Cheongryang
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- Auger Electron and X-Ray Photoelectron Spectroscopy Studies of Oxidation of Tin Using SnO_x Thin Films Grown by Reactive Ion-Assisted Deposition
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- Modeling and Initial Growth Mode of Ultrathin Film on the basis of Electrical Conductivity of Substrate
- Effect of Oxygen Ion Energy and Annealing in Formation of Tin Oxide Thin Films