Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition
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概要
- 論文の詳細を見る
The electrical conductance characteristics due to tunneling of Au films on glass substrates as a function of deposition rate and Ar+ ion current density have been investigated by in situ measurement. The onset thickness for conductance was 8.5–29 Å lower than that obtained by other researchers due to the use of a nozzle beam in this study. The degree of agglomeration, $t$, attained its maximum value at a deposition rate $R=1.0$ Å/s. The degree of coalescence increased with increasing deposition rate. The onset thickness for conductance decreased to a nearly linear line with increasing ion beam irradiation.
- Japan Society of Applied Physicsの論文
- 2004-01-15
著者
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KOH Seok-Keun
Thin Film Technology Research Center Korea Institute of Science and Technology
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SONG Seok-Kyun
UION Corporation
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Lee Deuk
Department Of Dermatology Asan Medical Center University Of Ulsan College Of Medicine
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Baik Hong-koo
Department Of Metallurgical Engineering College Of Engineering Yonsei University
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Lee Deuk
Department of Metallurgical System Engineering, Yonsei University, 134 Shincheon-dong, Seodaemoon-ku, Seoul 120-749, Korea
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Baik Hong-Koo
Department of Metallurgical System Engineering, Yonsei University, 134 Shincheon-dong, Seodaemoon-ku, Seoul 120-749, Korea
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Koh Seok-Keun
Thin Film Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650, Korea
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Koh Seok-Keun
Thin Film Research Center, Korea Institute of Science and Technology, Cheongryang P.O. Box 131, Seoul 130-650, Korea
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