Modeling and Initial Growth Mode of Ultrathin Film on the basis of Electrical Conductivity of Substrate

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-09-15

著者

• Lee D

  Department Of Metallurgical System Engineering Yonsei University

• Song Kie

  Department Of Metallurgical System Engineering Yonsei University

• KOH Seok-Keun

  Thin Film Technology Research Center Korea Institute of Science and Technology

• BAIK Hong-Koo

  Department of Metallurgical Engineering, Yonsei University

• Baik Hong-koo

  Department Of Metallurgical System Engineering Yonsei University

• SONG Seok-Kyun

  UION Corporation

• LEE Deuk

  Department of Metallurgical System Engineering, Yonsei University

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• Auger Electron and X-Ray Photoelectron Spectroscopy Studies of Oxidation of Tin Using SnO_x Thin Films Grown by Reactive Ion-Assisted Deposition
• Modeling and Initial Growth Mode of Ultrathin Film on the basis of Electrical Conductivity of Substrate
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• Charge Assisted Deposition of Polycrystalline Silicon Thin Films by Cesium Sputter Ion Beam Deposition
• Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition
• Modeling and Initial Growth Mode of Ultrathin Film on the basis of Electrical Conductivity of Substrate

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