Effect of Heat Treatment on Structural Characteristics and Electric Resistance in TaN_x Thin Film Deposited by RF Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-07-15

著者

• Lee D

  Department Of Metallurgical System Engineering Yonsei University

• Song J

  Samsung Electro‐mechanics Gyunggi‐do Kor

• Kim Yoon

  Electric And Magnetic Devices Research Group Korea Electrotechnology Research Institute

• LEE Dong

  Electronics and Telecommunications Research Institute

• Song Jae

  Electric And Magnetic Devices Research Group Korea Electrotechnology Research Institute Electric And

関連論文

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• Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition
• Security Analysis of a Variant of Self-Shrinking Generator
• Effect of Heat Treatment on Structural Characteristics and Electric Resistance in TaN_x Thin Film Deposited by RF Sputtering
• Elliptic Curve Discrete Logarithms and Wieferich Primes
• A New Surface Modification Method to Prevent the Release-Stiction of Micromechanical Structures during HF Vapor-Phase Etching

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