Postgrowth Irradiation of Hydrogenated Amorphous Carbon thin Films by Low-Energy Ion Beam
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-04-15
著者
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Kim Kyung
Department Of Genetic Engineering Kyungpook National University
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SEO Dae-Shik
Department of Electrical and Computer Engineering, Yonsei University
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Hwang J‐y
Department Of Electrical & Electronic Engineering Yonsei University
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Seo D‐s
Yonsei Univ. Seoul Kor
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Seo Dae-shik
Department Of Electrical Engineering College Of Engineering Soong Sil University
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Seo Dae-shik
Department Of Electrical & Electronic Engineering Yonsei University
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Seo Dae-shik
Department Of Electrical And Computer Engineering Yonsei University
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Seo Dae-shik
Department Of Electrical And Electronic Engineering (a-226) College Of Engneering Yonsei University
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Seo Dae-shik
Department Of Electrical And Electronic Engineering College Of Engineering Yonsei University
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LEE Se
Department of Dermatology, Seoul National University College of Medicine, Laboratory of Cutaneous Ag
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Baik Hong
Department Of Metallurgical Engineering Yonsei University
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Ahn Han
Department Of Metallurgical Engineering Yonsei University
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Song Kie
Department Of Metallurgical System Engineering Yonsei University
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Hwang Jeoung-yeon
Department Of Electrical And Electronic Engineering Yonsei University
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RHO Soon
Department of Metallurgical Engineering, Yonsei University
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JO Yong-Min
Department of Electrical & Electronic Engineering, Yonsei University
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Kim K
Department Of Metallurgical Engineering Yonsei University
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Jo Y‐m
Department Of Electrical & Electronic Engineering Yonsei University
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