Mechanism of a High-Contrast Inorganic Ion Resist Using Amorphous WO_3
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概要
- 論文の詳細を見る
Optical absorption spectra of thin amorphous WO_3 films irradiated by a beam of sodium ions at 〜10 kV have been measured in order to determine the properties of these films as a negative-type ion resist. A characteristic color band of amorphous tungsten bronze was observed in a relatively low-dose region. The resist behavior at the threshold dose D_<th> was linked with the appearance of a metallic luster at the film surface and with a corresponding change in the spectral shape. The surface sodium content at D_<th> was nearly equal to the value at the insulator-metal transition of sodium tungsten bronze. The mechanism of this inorganic resist is based on a change in the chemical potential; this is mainly due to doping effects by ion implantation and partly due to some structural change by energy deposition.
- 社団法人応用物理学会の論文
- 1986-12-20
著者
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Koshida Nobuyoshi
Department Of Electrical And Electronic Engineering Faculty Of Technology Graduate School Of Eng. To
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Koshida Nobuyoshi
Department Of Electronic Engineering Faculty Of Technology Tokyo University Of Agriculture And Techn
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TOMITA Osamu
Department of Electronic Engineering, Faculty of Technology, Tokyo University of Agriculture and Tec
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Tomita Osamu
Department Of Electronic Engineering Faculty Of Technology Tokyo University Of Agriculture And Techn
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