Recovery of Silicon Surface after Reactive Ion Etching of SiO_2 using CHF_3/C_2F_6 Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-03-15
著者
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Kim Kyung-Soo
Semiconductor Technology Division, ETRI
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Kim Kyung-soo
Semiconductor Div. Electronics And Telecommunications Research Institute
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Kim Kyung-soo
Semiconductor Technology Division Etri
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Park H‐h
Yonsei Univ. Seoul Kor
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Sung Yung-kwon
Department Of Electrical Engineering Korea University
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PARK Hyung-Ho
Department of Ceramic Engineering, Yonsei University
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KWON Kwang-Ho
Department of Electronic Engineering, Hanseo Unviersity
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KIM Chang-II
Department of Electrical Engineering, Anyang University
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Kim Chang-ii
Department Of Electrical Engineering Anyang University
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Park Hyung-ho
Department Of Ceramic Engineering Yonsei University
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Kwon K‐h
Hanseo Univ. Chung‐nam Kor
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Kwon Kwang-ho
Department Of Electronic Engineering Hanseo University
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KWON Kwang-Ho
Department of Control and Instrumentation Engineering, Korea University
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