Effects of F^+ Implantation on the Characteristics of Poly-Si Films and Low-Temperature n-ch Poly-Si Thin-Film Transistors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-03-15
著者
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AHN Byung
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Ahn B
Korea Advanced Inst. Sci. And Technol. Taejon Kor
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Park Jin
Semiconductor R&d Goldstar Electron Co. Ltd.
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Lee Kwyro
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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Lee Kwyro
Department Of Eecs Korea Advanced Institute Of Science And Technology
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Ahn Byung
Department Of Internal Medicine Hepatology Division Kangnam St. Mary's Hospital College Of Medi
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AHN Byung
Department of Decontamination and Decommissioning, Korea Atomic Energy Research Institute
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Lee Kwyro
Department of EE, Korea Advanced Institute of Science and Technology (KAIST)
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