Characteristics of Tunneling Nitride Grown by Electron Cyclotron Resonance Nitrogen Plasma Nitridation and Its Application to Low Voltage EEPROM
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概要
- 論文の詳細を見る
- 2000-08-28
著者
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Min Kyeong-sik
Memory Design Dept. 4 Hyundai Electronics Industries Co. Ltd.
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Lee Kwyro
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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Lee Kwyro
Department Of Eecs Korea Advanced Institute Of Science And Technology
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Lee Kwyro
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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