ECR型プラズマCVD法により合成された炭素薄膜の表面組織とプラズマ発光スペクトル強度
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概要
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This paper is concerned with the relationships between the morphology of carbon films and the intensity of emission spectra in ECR plasma CVD of the system CH_4-H2. A sample holder was connected in series to DC bias and it was negative to the apparatus. The application of negative bias caused an abrupt increase in emission intensity at about -100 V bias. At the same time, smooth and flat carbon films were formed. The abrupt increase in emission spectra intensity was caused by the cooperative effects between DC and ECR powers. The formation of flat and smooth surface was attributed to the abrupt increase in plasma density which gives high speed ions, molecules and electrons. They might prevent the formation of secondary particles through aggregation of primary particles and/or enhance the peening effect on the substrate.
- 社団法人日本セラミックス協会の論文
- 1991-08-01
著者
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鎌田 喜一郎
長岡技術科学大学工学部
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田辺 伊佐雄
長岡技科大
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田辺 伊佐雄
長岡技術科学大学
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Tanaka O
Institute Of Pharmaceutical Sciences Faculty Of Medicine Hiroshima University
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鎌田 喜一郎
長岡技術科学大学化学系
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丸山 一典
長岡技術科学大学化学系
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井上 亨
長岡技術科学大学化学系
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田辺 伊佐雄
長岡技術科学大学化学系
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Tanaka O
Institute Of Pharmaceutical Sciences Hiroshima University School Of Medicine
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鎌田 喜一郎
長岡技術科大学工学部
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