Reduction of Ohmic Contact Resistance on n-GaN by Surface Treatment Using Cl_2 Inductively Coupled Plasma Following Laser Lift-Off

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2007-03-15

著者

• Chen Shi-ming

  Epitech Technology Corporation

• Yokoyama Meiso

  Department of Electrical Engineering, National Cheng Kung University

• SU Shui-Hsiang

  Department of Electronic Engineering

• HOU Cheng-Chieh

  Department of Electronic Engineering

• LIN Ming-Hsun

  Department of Electronic Engineering, I-Shou University

• KUAN Hon

  Department of Electrical Engineering, Far East University

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