Index-Guide GaInNAs Laser Diode for Optical Communications
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Kondow M
Central Research Laboratory Hitachi Ltd.
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KITATANI Takeshi
RWCP Optical Interconnection Hitachi Laboratory co Central Research Laboratory, Hitachi, Ltd.
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KONDOW Masahiko
RWCP Optical Interconnection Hitachi Laboratory co Central Research Laboratory, Hitachi, Ltd.
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Yazawa Yoshiaki
Central Research Laboratory, Hitachi Ltd.
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Okai Makoto
Central Research Laboratory, Hitachi Ltd.
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Kondow M
Hitachi Ltd. Tokyo Jpn
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Kondow Masahiko
Graduate School Of Engineering Osaka University
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Kondow Masahiko
Rwcp Optical Interconnection Hitachi Laboratory C-o Central Research Laboratory Hitachi Ltd.
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Okai M
Hitachi Ltd. Tokyo Jpn
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Yazawa Y
Hitachi Ltd. Tokyo Jpn
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Yazawa Yoshiaki
Central Research Laboratory Hitachi Ltd.
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Nakatsuka S
Central Research Laboratory Hitachi Ltd.
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Kitatani T
Hitachi Ltd. Central Research Laboratory
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Kitatani Takeshi
Rwcp Optical Interconnection Hitachi Laboratory C-o Central Research Laboratory Hitachi Ltd.
関連論文
- Amplified Spontaneous Enission Measurement of GaInNAs Laser Wafers With and without Rapid Thermal Annealing
- Variation in Photoluminescence of Highly Strained GaInNAs/GaAs Multiple-Quantum-Well Structures with Different Thickness GaAs Barrier Layers(Semiconductors)
- Transition of Infrared Absorption Peaks in Thermally Annealed GaInNAS : Optics and Quantum Electronics : Optical Properties of Condensed Matter
- Analysis of Band Offset in GaNAs/GaAs by X-Ray Photoelectron Spectroscopy
- Temperature Dependence of the Threshold Current and the Lasing Wavelength in 1.3-μm GaIn N As/GaAs Single Quantum Well Laser Diode
- Index-Guide GaInNAs Laser Diode for Optical Communications
- Characterization of the Refractive Index of Strained GaInNAs Layers by Spectroscopic Ellipsometry
- Room-Temperature Pulsed Operation of GaInNAs Laser Diodes with Excellent High-Temperature Performance
- Analysis of Spot Shape Behavior on a Spot-Size Controllable Laser Diode
- Controlled Spot Size Laser Diode with Flared Stripe and Twin Stripe Modulator at Flare Base
- Reliability of 780-nm High-Power Laser Diodes with Thin Quantum Well Active Layer
- Nitrogen Gas Flow Driven Unintentional Incorporation of Al during the Growth of Dilute Nitride Semiconductor by Plasma-Assisted Molecular Beam Epitaxy
- Recent Progress in GaInNAs Laser(Special Issue on Advanced Optical Devices for Next Generation Photonic Networks)
- A 1.3-μm GaInNAs/GaAs Single-Quantum-Well Laser Diode with a High Characteristic Temperature over 200 K
- A 1.3-μm GaInNAs Laser Diode with a Lifetime of over 1000 Hours
- Photocurrent and Photoluminescence in InGaAs/GaAs Multiple Quantum Well Solar Cells
- Vertical Transport Properties of Photogenerated Carrier in InGaAs/GaAs Strained Multiple Quantum Welts
- Reduced Static Dielectric Constant Estimated from Exciton Binding Energy in Dilute Nitride Semiconductors
- Investigation of the Electron Nonradiative Transition in Extremely Thin GaInNAs/GaAs Single Quantum Well by Using a Piezoelectric Photothermal Spectroscopy
- Unintentional source incorporation in plasma-assisted molecular beam epitaxy
- Effect of plasma conditions on the growth of GaNAs by plasma-assisted molecular-beam epitaxy
- Polarized Raman Spectra and N-Related Local Vibrational Mode in GaNAs and GaInNAs Epitaxial Layers Grown on GaAs
- Infrared Absorption Spectrum of GaInNAs
- Excitation Intensity Dependence of Photoluminescence Spectra in GaInNAs Single Quantum Wells (Short Note)
- Index-Guide GaInNAs Laser Diode for Optical Communications
- GaInNAs:A Novel Material for Long-Wavelength-Range Laser Diodes with Excellent High-Temperature Performance
- Corrugation-Pitch-Modulated Distributed Feedback Lasers with Ultranarrow Spectral Linewidth
- Dry Etching of Al-Rich AlGaAs for Photonic Crystal Fabrication
- Reduction of $S$-parameter by the Introduction of Nitrogen in GaNAs: Positron Annihilation and Photoluminescence Spectroscopy Study
- Photosensing Resolution of Wireless Communication Chip in Inhomogeneous RF-Magnetic Field
- Characterization of the Refractive Index of Lateral-Oxidation-Formed Al_xO_y by Spectroscopic Ellipsometry
- In situ Annealing of GaInNAs up to 600°C
- Fabrication of -Oriented Si Film with a Ni/Ti Layer by Metal Induced Crystallization : Semiconductors
- Radio Frequency Identification Sensor Chips with Anticollision Algorithm for Simultaneous Detection of Multiple DNA Targets
- Introduction of GaInNAs Gain Medium into Circularly Arranged Photonic Crystal Cavity
- Unintentional Source Incorporation in Plasma-Assisted Molecular Beam Epitaxy
- GaInNAs: A Novel Material for Long-Wavelength-Range Laser Diodes with Excellent High-Temperature Performance
- Over 1.5 μm Deep Dry Etching of Al-Rich AlGaAs for Photonic Crystal Fabrication
- Characterization of the Oxide Film Obtained by Wet Oxidation of Al-Rich AlGaAs
- Over 1.5μm Deep Dry Etching of Al-Rich AlGaAs for Photonic Crystal Fabrication (Special Issue : Solid State Devices and Materials)