Low-Temperature Fabrication of Polycrystalline Si Thin Film Using Al-Induced Crystallization without Native Al Oxide at Amorphous Si/Al Interface
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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NAKASHIMA Hiroshi
Art, Science and Technology Center for Cooperative Research, Kyushu University
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Sugimoto Youhei
Department Of Applied Science For Electronics And Materials Interdisciplinary Graduate School Of Eng
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Sugimoto Youhei
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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TAKATA Naoki
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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HIROTA Takeshi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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IKEDA Ken-ichi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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YOSHIDA Fuyuki
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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NAKASHIMA Hideharu
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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