Effect of Ion Mass and Ion Energy on Low-Temperature Deposition of Polycrystalline-Si Thin Film on SiO2 Layer by Using Sputtering-Type Electron Cyclotron Resonance Plasma
スポンサーリンク
概要
- 論文の詳細を見る
Polycrystalline-Si thin film was successfully deposited on a SiO2 layer by using a sputtering-type electron cyclotron resonance plasma at the low substrate temperature of 400°C. The effects of ion (Ar, Kr, and Xe) mass and radius on the crystallization of deposited Si films were studied. Ions having a large mass and radius contributed more effective energy to Si atoms and thus crystallization was enhanced. The effect of substrate DC-bias for control of ion energy was also clarified. DC substrate bias voltage of $(-)50$ V for the Xe plasma was found to be most suitable for polycrystalline-Si growth.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-05-15
著者
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Sugimoto Youhei
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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WANG Dong
Advanced Science and Technology Center for Cooperative Research, Kyushu University
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Zhao Liwei
Advanced Science And Technology Center For Cooperative Research Kyush Univ.
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Wang Junli
Advanced Science And Technology Center For Cooperative Research Kyushu Univ.
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Saitou Taishi
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Nakashima Hiroshi
Advanced Science And Technology Center For Cooperative Research Kyushu University
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Wang Junli
Advanced Science and Technology Center for Cooperative Research, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Zhao Liwei
Advanced Science and Technology Center for Cooperative Research, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Sugimoto Youhei
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Saitou Taishi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Nakashima Hiroshi
Advanced Science and Technology Center for Cooperative Research, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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Nakashima Hiroshi
Advanced Science and Technology Center for Cooperative
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Wang Dong
Advanced Science and Technology Center for Cooperative Research, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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