Influence of Gas Pressure on Sputtering Deposition of Epitaxial BaTiO_3 Thin Films
スポンサーリンク
概要
著者
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Kawakubo Takashi
Corporate R&d Center Toshiba Corporation
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YASUMOTO Takaaki
Corporate R&D Center, Toshiba Corporation
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YANASE Naoko
Corporate R&D Center, Toshiba Corporation
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ABE Kazuhide
Corporate R&D Center, Toshiba Corporation
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FUKUSHIMA Noburu
Corporate R&D Center, Toshiba Corporation
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Yanase N
Corporate R&d Center Toshiba Corporation
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Abe Kazuhide
Corporate R&d Center Toshiba Corporation
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Yanase Naoko
Corporate R&d Center Toshiba Corporation
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Yasumoto Takaaki
Corporate R&d Center Toshiba Corporation
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Fukushima N
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Fukushima N
Corporate Research & Development Center Toshiba Corporation
関連論文
- Nonswitching Layer Model for Voltage Shift Phenomena in Heteroepitaxial Barium Titanate Thin Films
- Influence of Gas Pressure on Sputtering Deposition of Epitaxial BaTiO_3 Thin Films
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