Abe Kazuhide | Corporate R&d Center Toshiba Corporation
スポンサーリンク
概要
関連著者
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Abe Kazuhide
Corporate R&d Center Toshiba Corporation
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Kawakubo Takashi
Corporate R&d Center Toshiba Corporation
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Yanase N
Corporate R&d Center Toshiba Corporation
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Abe Kazuhide
Material And Devices Research Laboratories R&d Center Toshiba Corporation
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Fukushima N
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Fukushima N
Corporate Research & Development Center Toshiba Corporation
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ABE Kazuhide
Advanced Discrete Semiconductor Technology Laboratory, Corporate Research & Development Center, Tosh
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YANASE Naoko
Advanced Discrete Semiconductor Technology Laboratory, Corporate Research & Development Center, Tosh
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KAWAKUBO Takashi
Advanced Discrete Semiconductor Technology Laboratory, Corporate Research & Development Center, Tosh
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ABE Kazuhide
Materials and Devices Research Labs., R&D Center, Toshiba Corporation
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Komatsu S
Waseda Univ. Tokyo Jpn
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KAWAKUBO Takashi
Materials and Devices Research Labs., R&D Center, Toshiba Corporation
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KOMATSU Shuichi
Materials and Devices Research Labs., R&D Center, Toshiba Corporation
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SANO Kenya
Materials and Devices Research Labs., R&D Center, Toshiba Corporation
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YANASE Naoko
Materials and Devices Research Labs., R&D Center, Toshiba Corporation
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Sano K
Ntt Photonics Laboratories Ntt Corporation
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Komatsu Shuichi
Materials And Devices Laboratory R & D Center Toshiba Corporation
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Kawakubo Takashi
Materials & Devices Research Laboratories R & D Center Toshiba Corporation
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ABE Kazuhide
Corporate R&D Center, Toshiba Corporation
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FUKUSHIMA Noburu
Corporate R&D Center, Toshiba Corporation
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FUKUSHIMA Noburu
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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FUKUSHIMA Noburu
Materials and Devices Research Labs., R&D Center, Toshiba Corporation
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Yasumoto Takaaki
Corporate R&d Center Toshiba Corporation
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Fukushima Noburu
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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阿部 和秀
(株)東芝 研究開発センター
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Hieda Katsuhiko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Aoyama T
Toshiba Corp. Yokohama Jpn
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Aoyama T
Hitachi Ltc. Ibaraki Jpn
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YASUMOTO Takaaki
Advanced Discrete Semiconductor Technology Laboratory, Corporate Research & Development Center, Tosh
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YASUMOTO Takaaki
Corporate R&D Center, Toshiba Corporation
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YANASE Naoko
Corporate R&D Center, Toshiba Corporation
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ABE Kazuhide
The authors are with the Materials and Devices Research Laboratories, Toshiba Corporation
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YANASE Naoko
The authors are with the Materials and Devices Research Laboratories, Toshiba Corporation
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KOMATSU Shuichi
The authors are with the Materials and Devices Research Laboratories, Toshiba Corporation
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SANO Kenya
The authors are with the Materials and Devices Research Laboratories, Toshiba Corporation
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FUKUSHIMA Noburu
The authors are with the Materials and Devices Research Laboratories, Toshiba Corporation
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KAWAKUBO Takashi
The authors are with the Materials and Devices Research Laboratories, Toshiba Corporation
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Aoyama Tomonori
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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NIWA Shoko
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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KIYOTOSHI Masahiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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YAMAZAKI Souichi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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IZUHA Mitsuaki
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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EGUCHI Kazuhiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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ARIKADO Tunetoshi
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Niwa Shoko
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Arikado T
Semiconductor Leading Edge Technologies Inc.
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阿部 和秀
東芝・総合研究所
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Izuha Mitsuaki
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Yamazaki S
Toshiba Corp. Yokohama Jpn
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Eguchi K
Tokyo Metropolitan Univ. Tokyo Jpn
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Abe Kazuhide
Metals And Ceramics Laboratory Toshiba R&amo;d Center Toshiba Corporation
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Abe Kazuhide
Research And Development Center Toshiba Corporation
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Abe Kazuhide
Materials And Devices Research Laboratories R&d Center Toshiba Corporation
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阿部 和秀
(株)東芝研究開発センター Lsi基盤技術ラボラトリー
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阿部 和秀
(株)東芝
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Yanase Naoko
Corporate R&d Center Toshiba Corporation
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Kiyotoshi Masahiro
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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Arikado Tunetoshi
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
著作論文
- Nonswitching Layer Model for Voltage Shift Phenomena in Heteroepitaxial Barium Titanate Thin Films
- Influence of Gas Pressure on Sputtering Deposition of Epitaxial BaTiO_3 Thin Films
- Improvement of Ferroelectric Hysteresis Curves in Epitaxial BaTiO_3 Film Capacitors by 2-Step Deposition(Special Issue on Nonvolatile Memories)
- Bistable States of Ferroelectric Hysteresis Loops in a Heteroepitaxial BaTiO_3 Thin Film Capacitor
- Asymmetric Switching of Ferroelectric Polarization in a Heteroepitaxial BaTiO_3 Thin Film Capacitor
- Thickness Dependence of Ferroelectricity in Heteroepitaxial BaTiO_3 Thin Film Capacitors
- Ferroelectric Properties of SrRuO_3/(Ba,Sr)TiO_3/SrRuO_3 Epitaxial Capacitor
- Dielectric and Ferroelectric Properties of Heteroepitaxial Ba_xSr_TiO_3 Films Grown on SrRuO_3/SrTiO_3 Substrates(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Epitaxial Growth of Ti_Al_xN Buffer Layer for a Ferroelectric (Ba, Sr) TiO_3 Capacitor on Si Substrate
- Asymmetric Ferroelectricity and Anomalous Current Conduction in Heteroepitaxial BaTiO_3 Thin Films
- Ferroelectric Properties in Heteroepitaxial Ba_Sr_TiO_3 Thin Films on SrRuO_3/SrTiO_3 Substrates
- Influence of Lattice Distortion and Oxygen Defects in BST Films for Memory Capacitors
- Effects of Ambient Gas on Dielectric Constant of Sputtered SrTiO_3 Epitaxial Thin Films