Komatsu Shuichi | Materials And Devices Laboratory R & D Center Toshiba Corporation

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概要

• 同名の論文著者
• Materials And Devices Laboratory R & D Center Toshiba Corporationの論文著者

関連著者

• Abe Kazuhide

  Material And Devices Research Laboratories R&d Center Toshiba Corporation

• Komatsu Shuichi

  Materials And Devices Laboratory R & D Center Toshiba Corporation

• KOMATSU Shuichi

  Materials and Devices Research Labs., R&D Center, Toshiba Corporation

• ABE Kazuhide

  Materials and Devices Research Labs., R&D Center, Toshiba Corporation

• Komatsu S

  Waseda Univ. Tokyo Jpn

• Abe Kazuhide

  Corporate R&d Center Toshiba Corporation

• Kawakubo Takashi

  Corporate R&d Center Toshiba Corporation

• KAWAKUBO Takashi

  Materials and Devices Research Labs., R&D Center, Toshiba Corporation

• SANO Kenya

  Materials and Devices Research Labs., R&D Center, Toshiba Corporation

• YANASE Naoko

  Materials and Devices Research Labs., R&D Center, Toshiba Corporation

• Yanase N

  Corporate R&d Center Toshiba Corporation

• Kawakubo Takashi

  Materials & Devices Research Laboratories R & D Center Toshiba Corporation

• FUKUSHIMA Noburu

  Materials and Devices Research Labs., R&D Center, Toshiba Corporation

• Sano K

  Ntt Photonics Laboratories Ntt Corporation

• Fukushima N

  Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation

• 阿部 和秀

  (株)東芝 研究開発センター

• 阿部 和秀

  東芝・総合研究所

• Abe Kazuhide

  Metals And Ceramics Laboratory Toshiba R&amo;d Center Toshiba Corporation

• Abe Kazuhide

  Materials And Devices Laboratory R & D Center Toshiba Corporation

• Abe Kazuhide

  Research And Development Center Toshiba Corporation

• Abe Kazuhide

  Materials And Devices Research Laboratories R&d Center Toshiba Corporation

• Abe Kazuhide

  Materials And Devices Research Laboratories R & D Center Toshiba Corporation

• 阿部 和秀

  (株)東芝研究開発センター Lsi基盤技術ラボラトリー

• 阿部 和秀

  (株)東芝

• Komatsu Shuichi

  Materials And Devices Research Laboratories R&d Center Toshiba Corporation

• Komatsu Shuichi

  Materials And Devices Research Laboratories R & D Center Toshiba Corporation

• Fukushima N

  Corporate Research & Development Center Toshiba Corporation

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著作論文

• Ferroelectric Properties of SrRuO_3/(Ba,Sr)TiO_3/SrRuO_3 Epitaxial Capacitor
• Asymmetric Ferroelectricity and Anomalous Current Conduction in Heteroepitaxial BaTiO_3 Thin Films
• Ferroelectric Properties in Heteroepitaxial Ba_Sr_TiO_3 Thin Films on SrRuO_3/SrTiO_3 Substrates
• Effects of Ambient Gas on Dielectric Constant of Sputtered SrTiO_3 Epitaxial Thin Films
• Epitaxial Growth and Dielectric Properties of (Ba_Sr_)TiO_3 Thin Film ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
• Dielectric Constant and Leakage Current of Epitaxially Grown and Polycrystalline SrTiO_3 Thin Films
• Measurement and Thermodynamic Analyses of the Dielectric Constant of Epitaxially Grown SrTiO_3 Films
• Crystallographic Orientation Dependence of Dielectric Constant in Epitaxially Grown SrTiO_3 Films

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