MAEDA Takayoshi | Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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概要
関連著者
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MAEDA Takayoshi
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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Maeda T
Tsukuba Research Laboratory Sumitomochemical Co. Ltd.
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Iyechika Yasushi
Tsukuba Research Laboratory Sumitomochemical Co. Ltd.
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IYECHIKA Yasushi
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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Hiramatsu Kazumasa
Division Of Electrical And Electronic Engineering Graduate School Of Engineering Mie University
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Hiramatsu K
Ntt Corp. Tsukuba‐shi Jpn
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Miyake Hideto
Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University
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Hiramatsu Kazumasa
Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University
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Miyake Hideto
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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Hiramatsu Kazumasa
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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Miyamoto A
New Ind. Creation Hatchery Center Tohoku Univ.
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MIYAMOTO Akira
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University
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Kubo Momoji
Department Of Molecular Chemistry And Engineering Tohoku University
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Kubo Momoji
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Maeda T
Central Research Laboratory Hitachi Ltd.
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Maeda T
Electron Devices Division Electrotechnical Laboratory
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Miyamoto Akira
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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ONOZU Takayuki
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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Onozu Takayuki
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Miura Ryuji
Department of Chemical Engineering, Graduate School of Engineering, Tohoku University
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Honda Y
Department Of Electronics Nagoya University
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Honda Yoshio
Department Of Electronics School Of Engineering Nagoya University Chikusa-ku Nagoya
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Honda Y
Tokyo Inst. Technol. Tokyo Jpn
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Fujii M
Samsung Yokohama Res. Inst. Co. Ltd. Yokohama‐shi Jpn
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Fujii M
Tokyo University Of Science:(present Office)utsunomiya University
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Fujii M
Yamanouchi Pharmaceutical Co. Ltd. Ibaraki Jpn
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SAWAKI Nobuhiko
Department of Electronics, School of Engineering, Nagoya University, Chikusa-ku, Nagoya
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Takami S
Corporate Manufacturing Engineering Center Toshiba Corporation
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Honda Yoshio
Department Of Electronics Nagoya University
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Honda Y
Hitachi Ltd. Kokubunji‐shi Jpn
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Honda Y
Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.
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TAKAMI Seiichi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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Takami Seiichi
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
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Miura Ryuji
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Sawaki N
Nagoya Univ. Nagoya Jpn
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Sawaki Nobuhiko
Department Of Electronics Faculty Of Engineering Nagoya University
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Miura Ryuji
Department Of Cardiovascular Medicine Okayama University
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Miura Ryuji
Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-11-1302 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan
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Sawaki Nobuhiko
Department of Electrical and Electronic Engineering, Aichi Institute of Technology, Toyota, Aichi 470-0392, Japan
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SAWAKI Nobuhiko
Department of Electronics, Nagoya University
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Takeuchi K
Riken (the Institute Of Physical And Chemical Research)
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SONE HIROKI
Department of Geophysics, School of Earth Sciences, Stanford University
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Sone Hiroki
Department Of Electronics School Of Engineering Nagoya University
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Sone Hiroki
Department Of Chemistry Faculty Of Science Nagoya University
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Fujii M
Nec Corp. Tsukuba‐shi Jpn
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TOKUSHIMA Masatoshi
NEC Corporation, Fundamental and Environmental Research Laboratories
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KAWAGUCHI Yasutoshi
Department of Electronics, School of Engineering, Nagoya University, Chikusa-ku, Nagoya
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Kawasaki Masashi
Department Of Applied Biological Science Tokyo Noko University
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HONDA Yoshiaki
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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Takeuchi K
Greduate School Of Science And Engineering Saitama University:riken (the Institute Of Physical And C
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ISHIKAWA Masaoki
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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YOSHIDA Nobuhide
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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FUJII Masahiro
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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MAEDA Tadashi
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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Honda Yoshiaki
Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.
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TERAISHI Kazuo
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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Cheettu S.salai
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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INABA Yusaku
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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GUNJI Isao
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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Yamaguchi M
Toyota Technological Inst. Nagoya Jpn
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Gunji Isao
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Inaba Yusaku
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Teraishi Kazuo
Department Of Materials And Chemistry Graduate School Of Engineering Tohoku University
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Ishikawa M
Ntt Corp. Atsugi‐shi Jpn
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YOSHIDA Nobuhide
NEC Corporation
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Ikenaga Yoshihiko
Microsystem Research Ceterk Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Inaba Y
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Motogaito Atsushi
Division Of Electrical And Electronic Engineering Graduate School Of Engineering Mie University
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Bohyama Shinya
Department of Electrical and Electronic Engineering, Mie University, 1515 Kamihama, Tsu 514-8507, Ja
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Tokushima M
Nec Corporation Fundamental And Environmental Research Laboratories
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Bohyama Shinya
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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OHNO Yasuo
Institute of Technology and Science, The University of Tokushima
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OHNO Yasuo
Microelectronics Research Labs.,NEC Corporation
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Kubo Momoji
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Bertram F
Otto-von-guericke‐univ. Magdeburg Magdeburg Deu
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Christen J
Otto-von‐guericke Univ. Magdeburg Deu
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Christen Jurgen
Institute Of Experimental Physics Otto-von-guericke University
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Ohno Y
National Inst. Health Sci. Tokyo Jpn
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Shimizu Masaya
Tsukuba Research Laboratory Sumitomochemical Co. Ltd.
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YAMAGUCHI Masahito
Department of Electronics, School of Engineering, Nagoya University, Chikusa-ku, Nagoya
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WADA Shigeki
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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TOKUSHIMA Masatoshi
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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FUJII Masahiro
Microelectronics Laboratories, NEC Corporation
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MAEDA Tadashi
Microelectronics Laboratories, NEC Corporation
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TOKUSHIMA Masatoshi
Microelectronics Laboratories, NEC Corporation
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ISHIKAWA Masaoki
Microelectronics Laboratories, NEC Corporation
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FUKAISHI Muneo
Microelectronics Laboratories, NEC Corporation
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HIDA Hikaru
Microelectronics Laboratories, NEC Corporation
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HIRAMATSU Kazumasa
The authors are with the Department of Electrical and Electronic Engineering, Mie University
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MOTOGAITO Atsushi
The authors are with the Department of Electrical and Electronic Engineering, Mie University
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MIYAKE Hideto
The authors are with the Department of Electrical and Electronic Engineering, Mie University
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HONDA Yoshiaki
The authors are with Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd
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IYECHIKA Yasushi
The authors are with Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd
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MAEDA Takayoshi
The authors are with Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd
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BERTRAM Frank
The authors are with Institut fur Experimentelle Physik, Otto-von-Guericke-Universitat
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CHRISTEN Juergen
The authors are with Institut fur Experimentelle Physik, Otto-von-Guericke-Universitat
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HOFFMANN Axel
The author is with Institut fur Festkorperphysik, Technische Universitat
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AMMAL S.
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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YOSHIKAWA Kenji
Department of Neurology, Kyoto Prefectural University of Medicine
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Hida H
Microelectronics Laboratories Nec Corporation:system Asic Division Nec Corporation
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Kugiya F
Data Storage Amp Retrieval Systems Div. Hitachi Ltd.
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Wada Shigeki
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Hoffmann Axel
The Author Is With Institut Fur Festkorperphysik Technische Universitat
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Fukaishi M
Nec Corp. Sagamihara‐shi Jpn
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Numata Keiichi
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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TAKAHASHI Masahiko
Central Research Laboratory, Hitachi, Ltd.
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TSUTSUI Hiroaki
ULSI Device Development Laboratories, NEC Corporation
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Maeda Takeshi
Data Storage amp Retrieval Systems Division, Hitachi Ltd.
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ASAI Shuji
NEC Corporation
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ATSUMO Takao
Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
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ASAI Shuji
ULSI Device Development Laboratories, NEC Corporation
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KOHNO Michihisa
ULSI Device Development Laboratories, NEC Corporation
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OIKAWA Hirokazu
ULSI Device Development Laboratories, NEC Corporation
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NAMBU Shingo
Department of Electronics, School of Engineering, Nagoya University
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Nambu Shingo
Department Of Electronics School Of Engineering Nagoya University
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Yamaguchi Masahito
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Atsumo Takao
Optoelectronics And High Frequency Device Research Laboratories Nec Corporation
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Takahashi M
Ntt Microsystem Integration Lab. Atsugi‐shi Jpn
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Christen Juergen
The Authors Are With Institut Fur Experimentelle Physik Otto-von-guericke-universitat
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Kugiya Fumio
Data Storage amp Retrieval Systems Div., Hitachi, Ltd.
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MOTOGAITO Atsushi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University
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YAMAGUCHI Motoo
Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University
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Bertram Frank
The Authors Are With Institut Fur Experimentelle Physik Otto-von-guericke-universitat
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Yoshikawa Kenji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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Kohno M
Ulsi Device Development Laboratories Nec Corporation
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Tsuchida Yoshihiko
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd., 6 Kitahara, Tsukuba 300-3294, Japan
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NAOI Hiroyuki
Satellite Venture Business Laboratory, Mie University
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MAEDA Takayosi
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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HAINO Masahiro
Department of Electrical and Electronic Engineering, Faculty of Engineering, Mie University
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Haino Masahiro
Department Of Electrical And Electronic Engineering Faculty Of Engineering Mie University
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Tsutsui Hiroaki
Ulsi Device Development Laboratories Nec Corporation
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Tsuchida Yoshihiko
Sumitomo Chemical Co. Ltd. Ibaraki Jpn
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Yoshikawa Kenji
Department Of Chemistry Waseda University
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Naoi Hiroyuki
Satellite Venture Business Laboratory Mie University
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Oikawa Hirokazu
Ulsi Device Development Laboratories Nec Corporation
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Maeda Takeshi
Data Storage Amp Retrieval Systems Division Hitachi Ltd.
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Ohno Yasuo
Microelectronics Research Labs. Nec Corporation
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TSUCHIDA Yoshihiko
Tsukuba Research Laboratory, Sumitomo Chemical Co., Ltd.
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YAMAGUCHI Masahito
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University
著作論文
- 0.21-fJ GaAs DCFL Circuits Using 0.2-μm Y-Shaped Gate AlGaAs/InGaAs E/D-HJFETs (Special Issue on Ultra-High-Speed IC and LSI Technology)
- A 1.3V Supply Voltage AlGaAs/InGaAs HJFET SCFL D-FF Operating at up to 10Gbps (Special Issue on Ultra-High-Speed LSIs)
- Transmission Electron Microscopy Investigation of Dislocations in GaN Layer Grown by Facet-Controlled Epitaxial Lateral Overgrowth : Semiconductors
- Crystalline and Optical Properties of ELO GaN by HVPE Using Tungsten Mask(Special Issue on Blue Laser Diodes and Related Devices/Technologies)
- Crystal Orientation Fluctuation of Epitaxial-Lateral-Overgrown GaN with W Mask and SiO_2 Mask Observed by Transmission Electron Diffraction and X-Ray Rocking Curves
- Investigation of Thermal Annealing Process of GaN Layer on Sapphire by Molecular Dynamics
- Investigation of Initial Growth Process of GaN Film on Sapphire Using Computational Chemistry
- Investigation of Growth Process of GaN Film on Sapphire by Computational Chemistry
- Computational Studies on GaN Surface Polarity and InN/GaN Heterostructures by Density Functional Theory and Molecular Dynamics
- Study on Surface Polarity of GaN by Density Functional Theory and Molecular Dynamics
- Distribution of Threading Dislocations in Epitaxial Lateral Overgrowth GaN by Hydride Vapor-Phase Epitaxy Using Mixed Carrier Gas of H_2 and N_2(Semiconductors)
- Optical and Crystalline Properties of Epitaxial-Lateral-Overgrown-GaN Using Tungsten Mask by Hydride Vapor Phase Epitaxy
- ECL-Compatible Low-Power-Consumption 10-Gb/s GaAs 8 : 1 Multiplexer and 1 : 8 Demultiplexer (Special Issue on High-Frequency/speed Devices in the 21st Century)
- Future Technology Trends on Magneto-Optical Recording
- Freestanding GaN Substrate by Advanced Facet-Controlled Epitaxial Lateral Overgrowth Technique with Masking Side Facets
- X-Ray Analysis of Twist and Tilt of GaN Prepared by Facet-Controlled Epitaxial Lateral Overgrowth (FACELO)
- Buried Tungsten Metal Structure Fabricated by Epitaxial-Lateral-Overgrown GaN via Low-Pressure Metalorganic Vapor Phase Epitaxy