Kitaura Y | Research And Development Center Toshiba Corp.
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概要
関連著者
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Uchitomi N
Research And Development Center Toshiba Corp.
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Kitaura Y
Research And Development Center Toshiba Corp.
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Nagaoka M
Research And Development Center Toshiba Corp.
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吉村 昌弘
Division Of Electric Electronic And Information Engineering Graduate School Of Engineering Osaka Uni
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Tanabe Y
Tokyo Inst. Of Technol. Yokohama‐shi
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Tanabe Y
Hiroshima Univ. Higashihiroshima Jpn
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Tanabe Yoshikazu
Research And Development Center Toshiba Corp.
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亀山 敦
神奈川大学工学部化学教室
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Nishihori K
Toshiba Corp. Kawasaki‐shi Jpn
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MIHARA Masakatsu
Research and Development Center, Toshiba Corp.
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HIROSE Mayumi
Research and Development Center, Toshiba Corporation
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Mihara Masakatsu
Research And Development Center Toshiba Corp.
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Hirose M
Ntt Electronics Ebina‐shi Jpn
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Uchitomi Naotaka
Ulsi Laboratories Toshiba Research And Development Center
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Uchitomi Naotaka
Research And Development Center Toshiba Corporation
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KITAURA Yoshiaki
ULSI Laboratories, Toshiba Research and Development Center
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KITAURA Yoshiaki
Research and Development Center, TOSHIBA CORPORATION
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Kitaura Yoshiaki
Ulsi Laboratories Toshiba Research And Development Center
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HIROSE Mayumi
ULSI Research Laboratories, TOSHIBA CORPORATION
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Kawakyu Katsue
Toshiba Corp. Research And Development Center
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Kitaura Yoshiaki
Research And Development Center Toshiba Corp.
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吉村 昌弘
東工大・工材研
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Ikeda Y
Mitsubishi Electric Corporation Information Technology R&d Center
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Ikeda Y
Mitsubishi Electric Corp. Kamakura‐shi Jpn
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Ishida Koichi
Optoelectronics Joint Research Laboratory:(present Address) Fundamental Research Laboratories Nec Co
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Ishida K
Semiconductor System Engineering Center Toshiba Corporation
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KAMEYAMA Atsushi
Research and Development Center, TOSHIBA CORPORATION
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NAGAOKA Masami
Research and Development Center, TOSHIBA CORPORATION
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YOSHIMURA Misao
Research and Development Center, TOSHIBA CORPORATION
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Nagaoka Masami
Toshiba Research and Development Center
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Kitaura Yoshiaki
Toshiba Research and Development Center
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Uchitomi Naotaka
Toshiba Research and Development Center
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Nishihori Kazuya
Ulsi Research Center Toshiba Corporation
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Yoshimura Misao
Research And Development Center Toshiba Corp.
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Ishida K
Yamagata Univ. Yamagata Jpn
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石田 謙司
神戸大学 大学院工学研究科
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Nagaoka Masami
Research and Development Center, Toshiba Corp.
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Sasaki Tatsuya
Opto And Wireless Deivce Res. Labs. Nec Corporation
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KAWAKYU Katsue
Research and Development Center, TOSHIBA CORPORATION
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IKEDA Yoshiko
Research and Development Center, TOSHIBA CORPORATION
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Kawakyu Katsue
Toshiba Research and Development Center
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Tanabe Yoshikazu
Toshiba Research and Development Center
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Yoshimura Misao
Toshiba Research and Development Center
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Ishida Kenji
Toshiba Research and Development Center
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Tanabe Yoshikazu
Research Institutefor Polymers And Textiles
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WAKIMOTO Hirotsugu
Research and Development Center, Toshiba Corp.
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NAGAOKA Masami
ULSI Research Laboratories, Toshiba Corporation
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TANABE Yoshikazu
ULSI Research Laboratories, Toshiba Corporation
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MIHARA Masakatsu
ULSI Research Laboratories, Toshiba Corporation
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YOSHIMURA Misao
ULSI Research Laboratories, Toshiba Corporation
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Sasaki T
Opto And Wireless Deivce Res. Labs. Nec Corporation
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Wakimoto Hirotsugu
Research And Development Center Toshiba Corp.
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Seshita Toshiki
Research And Development Center Toshiba Corp.
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Maeda Tadahiko
Research Institute of Science and Technology for Society, Japan Science and Technology Agency
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Takagi E
Toshiba Corp. Kawasaki‐shi Jpn
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Ishida Shinji
Ulsi Devices Development Laboratories Nec Corporation
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Ishida S
Toshiba Microelectronics Corp.
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Maeda Tadahiko
Research And Development Center Toshiba Corporation
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Nishio Johji
Research And Development Center Toshiba Corporation
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Nozaki Chiharu
Research And Development Center Toshiba Corporation
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Takagi Eiji
Corporate Research & Development Center Toshiba Corporation
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ISHIDA Kenji
Semiconductor System Engineering Center, TOSHIBA CORPORATION
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NITTA Tomohiro
Research and Development Center, TOSHIBA CORPORATION
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Inoue Tomotoshi
Toshiba Research and Development Center
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Obayashi Shuichi
Toshiba Research and Development Center
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Kayano Hiroyuki
Toshiba Research and Development Center
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Takagi Eiji
Toshiba Research and Development Center
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MATSUNAGA Tokuhiko
Toshiba R & D Center
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NISHIHORI Kazuya
Toshiba R & D Center
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HASHIMOTO Takashi
Toshiba R & D Center
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MIHARA Masakatsu
Toshiba R & D Center
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Ishida Kohtaro
Department Of Physics Science University Of Tokyo
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SESHITA Toshiki
Research and Development Center, Toshiba Corp.
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OYA Keiji
Semiconductor System Engineering Center, Toshiba Corp.
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NAGASAWA Hironori
Toshiba Microelectronics Corp.
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HONMYO Kenji
Discrete Semiconductor Div., Toshiba Corp.
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ISHIDA Shinji
Toshiba Microelectronics Corp.
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WAKIMOTO Hirotsugu
Toshiba Research and Development Center
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SESHITA Toshiki
Toshiba Research and Development Center
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KAMEYAMA Atsushi
Toshiba Research and Development Center
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NISHIHORI Kazuya
Research and Development Center, Toshiba Corporation
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SASAKI Tadahiro
ULSI Research Laboratories, TOSHIBA CORPORATION
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OTAKA Shoji
Research and Development Center, TOSHIBA CORPORATION
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UMEDA Toshiyuki
Research and Development Center, TOSHIBA CORPORATION
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KAMEYAMA Atsushi
ULSI Research Laboratories, Toshiba Corporation
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IKEDA Yoshiko
ULSI Research Laboratories, Toshiba Corporation
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SAITO Yasuyuki
Microelectronics Center in Tamagawa Works, Toshiba Corporation
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FUKUDA Katsuyoshi
Research and Development Center, Toshiba Corporation
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YASUAMI Sigeru
ULSI Research Center, Toshiba Corporation
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YASHIRO Satao
Semiconductor Division of Horikawa Works, Toshiba Corporation
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WASHIZUKA Shoichi
Semiconductor Division of Horikawa Works, Toshiba Corporation
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WATANABE Masayuki
Semiconductor Division of Horikawa Works, Toshiba Corporation
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Oya Keiji
Semiconductor System Engineering Center Toshiba Corp.
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Honmyo Kenji
Discrete Semiconductor Div. Toshiba Corp.
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Kayano Hiroyuki
Toshiba Corporation
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Ishida Kenji
Semiconductor System Engineering Center Toshiba Corporation
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Inoue T
Ntt Docomo Chugoku Hiroshima‐shi Jpn
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Otaka Shoji
Research And Development Center Toshiba Corporation
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Saito Yasuyuki
Micro-electronics Center In Tamagawa Works Toshiba Corporation
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Saito Yasuyuki
Microelectronics Center In Tamagawa Works Toshiba Corporation
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Nitta T
Research And Development Center Toshiba Corporation
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Sasaki Tadahiro
Ulsi Research Laboratories Toshiba Corporation
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Umeda T
Toshiba Corp. Kawasaki‐shi Jpn
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Kameyama Atsushi
Toshiba Corporation Semiconductor Company
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Yasuami Sigeru
Ulsi Research Center Toshiba Corporation
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Nitta Tomohiro
Research And Development Center Toshiba Corporation
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Fukuda Katsuyoshi
Research And Development Center Toshiba Corporation
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Washizuka Shoichi
Semiconductor Division Of Horikawa Works Toshiba Corporation
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Obayashi S
Corporate R&d Center Toshiba Corp.
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Obayashi Shuichi
Toshiba Corporation
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Watanabe Masayuki
Semiconductor Division Of Horikawa Works Toshiba Corporation
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Nishihori Kazuya
Research And Development Center Toshiba Corporation
著作論文
- A Resonant-Type GaAs Switch IC with Low Distortion Characteristics for 1.9GHz PHS (Special Issue on Microwave and Millimeterwave High-power Devices)
- A Monolithic GaAs Linear Power Amplifier Operating with a Single Low 2.7-V Supply for 1.9-GHz Digital Mobile Communication Applications
- Refractory WN_x/W Self-Aligned Gate GaAs Power Metal-Semiconductor Field-Effect Transistor for 1.9-GHz Digital Mobile Communication System Operating with a Single Low-Voltage Supply
- Single 3-V Supply Operation GaAs Linear Power MESFET Amplifier for 5.8-GHz ISM Band Applications (Special Issue on Microwave and Millimeter Wave Technology)
- 0.012-cc Miniaturized GaAs P-Pocket Power MESFET Amplifier Operating with a Single Voltage Supply for PHS Applications
- Single Low 2.4-V Supply Operation GaAs Power MESFET Amplifier with Low-Distortion Gain-Variable Attenuator for 1.9-GHz PHS Applications(Special Issue on Microwave and Millimeter-Wave Module Technology)
- A Buried-Channel Self-Aligned GaAs MESFET with High Power-Efficiency and Low Noise-Figure for 1.9-GHz Single-Chip Front-End MMICs (Special Issue on Low-Power and High-Speed LSI Technologies)
- Gate Current Control Method by Pull-Down FET's for 0-28dB GaAs Variable Attenuator in Direct-Conversion Modulator IC for 1.9GHz PHS (Special Issue on Microwave and Millimeterwave High-power Devices)
- A Buried-Channel WN_x/W Self-Aligned GaAs MESFET with High Power-Efficiency and Low Noise-Figure for Single-Chip Front-End MMIC in Personal Handy Phone System
- Buried-Channel WN_x/W Self-Aligned GaAs MESFET Process with Selectively Implanted Channel and Undoped Epitaxial Surface Layers for MMIC Applications
- Scatterings of Shallow Threshold Voltage on Si-Implanted WN Self-Alignment Gate GaAs Metal-Semiconductor Field-Effect Transistors on Different Composition 2-Inch Substrates by Growing in Three Kinds of Furnaces