Tanabe Y | Tokyo Inst. Of Technol. Yokohama‐shi
スポンサーリンク
概要
関連著者
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Tanabe Y
Tokyo Inst. Of Technol. Yokohama‐shi
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Tanabe Y
Hiroshima Univ. Higashihiroshima Jpn
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Tanabe Yoshikazu
Research And Development Center Toshiba Corp.
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Uchitomi N
Research And Development Center Toshiba Corp.
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Kitaura Y
Research And Development Center Toshiba Corp.
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吉村 昌弘
Division Of Electric Electronic And Information Engineering Graduate School Of Engineering Osaka Uni
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Burkhard Gunther
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Nagaoka M
Research And Development Center Toshiba Corp.
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MIHARA Masakatsu
Research and Development Center, Toshiba Corp.
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Sawaoka A
Tokyo Inst. Technol. Yokohama Jpn
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Mihara Masakatsu
Research And Development Center Toshiba Corp.
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Nishihori K
Toshiba Corp. Kawasaki‐shi Jpn
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Tamura H
R&d Center Kasado Administrative Division Power & Industrial Systems Hitachi Ltd.
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Tanabe Yoshikazu
National Institute Of Materials And Chemical Research
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HIROSE Mayumi
Research and Development Center, Toshiba Corporation
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Tanabe Yasuhiro
Center For Materials Design Materials And Structures Laboratory Tokyo Institute Of Technology
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BURKHARD Gunther
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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SAWAOKA Akira
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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Sawaoka Akira
Center For Ceramics Research Research Laboratory Of Engineering Materials Tokyo Institute Of Technol
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KAITO Akira
National Institute of Advanced Industrial Science and Technology (AIST)
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Kaito A
National Institute Of Materials And Chemical Research
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Tamura Hitoshi
Mechanical Engineering Research Laboratory Hitachi Ltd.
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YATABE Tetsuo
National Institute of Materials and Chemical Research
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Hirose M
Ntt Electronics Ebina‐shi Jpn
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Tamura Hideki
Faculty Of Eng. Yamagata Univ.
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吉村 昌弘
東工大・工材研
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Yamada K
Meijo Univ. Nagoya Jpn
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Ikeda Y
Mitsubishi Electric Corporation Information Technology R&d Center
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Ikeda Y
Mitsubishi Electric Corp. Kamakura‐shi Jpn
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Yamada Kazushi
Department Of Polymer Science And Engineering Kyoto Institute Of Technology
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Uchitomi Naotaka
Ulsi Laboratories Toshiba Research And Development Center
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Uchitomi Naotaka
Research And Development Center Toshiba Corporation
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KITAURA Yoshiaki
ULSI Laboratories, Toshiba Research and Development Center
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Ishida Koichi
Optoelectronics Joint Research Laboratory:(present Address) Fundamental Research Laboratories Nec Co
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亀山 敦
神奈川大学工学部化学教室
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Ishida K
Semiconductor System Engineering Center Toshiba Corporation
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YOSHIMURA Misao
Research and Development Center, TOSHIBA CORPORATION
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KITAURA Yoshiaki
Research and Development Center, TOSHIBA CORPORATION
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Nagaoka Masami
Toshiba Research and Development Center
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Tanabe Yoshikazu
Toshiba Research and Development Center
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Yoshimura Misao
Toshiba Research and Development Center
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Ishida Kenji
Toshiba Research and Development Center
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Kitaura Yoshiaki
Toshiba Research and Development Center
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Uchitomi Naotaka
Toshiba Research and Development Center
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Tanabe Yoshikazu
Research Institutefor Polymers And Textiles
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Nishihori Kazuya
Ulsi Research Center Toshiba Corporation
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Kitaura Yoshiaki
Ulsi Laboratories Toshiba Research And Development Center
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Yoshimura Misao
Research And Development Center Toshiba Corp.
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HIROSE Mayumi
ULSI Research Laboratories, TOSHIBA CORPORATION
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NAGAOKA Masami
ULSI Research Laboratories, Toshiba Corporation
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TANABE Yoshikazu
ULSI Research Laboratories, Toshiba Corporation
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MIHARA Masakatsu
ULSI Research Laboratories, Toshiba Corporation
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YOSHIMURA Misao
ULSI Research Laboratories, Toshiba Corporation
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Ishida K
Yamagata Univ. Yamagata Jpn
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Yamada Keiichi
Department Of Electrical Engineering Hiroshima University
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Tanabe Yasuhiro
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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DAN Koji
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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YAMADA Kenjiro
Department of Chemistry, The National Defense Academy
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Dan Koji
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Sawaoka Akira
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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TAMURA Hideki
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Kitaura Yoshiaki
Research And Development Center Toshiba Corp.
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Tamura Hideki
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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石田 謙司
神戸大学 大学院工学研究科
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YASUDA Eiichi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Sasaki Tatsuya
Opto And Wireless Deivce Res. Labs. Nec Corporation
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Takagi E
Toshiba Corp. Kawasaki‐shi Jpn
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Tanabe Yasuhiro
Department of Cardiology, Tokyo Metropolitan Hiroo Hospital
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Yasuda Eiichi
Materials And Structures Laboratory Tokyo Institute Of Technology
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Yasuda Eiichi
Materials And Structure Laboratory Tokyo Institute Of Technology
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SAKURAI Hideki
Department of Chemistry, Faculty of Science, Tohoku University
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Takagi Eiji
Corporate Research & Development Center Toshiba Corporation
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KAMEYAMA Atsushi
Research and Development Center, TOSHIBA CORPORATION
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IKEDA Yoshiko
Research and Development Center, TOSHIBA CORPORATION
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NAGAOKA Masami
Research and Development Center, TOSHIBA CORPORATION
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Inoue Tomotoshi
Toshiba Research and Development Center
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Kawakyu Katsue
Toshiba Research and Development Center
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Obayashi Shuichi
Toshiba Research and Development Center
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Kayano Hiroyuki
Toshiba Research and Development Center
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Takagi Eiji
Toshiba Research and Development Center
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MATSUNAGA Tokuhiko
Toshiba R & D Center
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NISHIHORI Kazuya
Toshiba R & D Center
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HASHIMOTO Takashi
Toshiba R & D Center
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MIHARA Masakatsu
Toshiba R & D Center
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WAKIMOTO Hirotsugu
Research and Development Center, Toshiba Corp.
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SESHITA Toshiki
Research and Development Center, Toshiba Corp.
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OYA Keiji
Semiconductor System Engineering Center, Toshiba Corp.
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NISHIHORI Kazuya
Research and Development Center, Toshiba Corporation
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KAMEYAMA Atsushi
ULSI Research Laboratories, Toshiba Corporation
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IKEDA Yoshiko
ULSI Research Laboratories, Toshiba Corporation
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Oya Keiji
Semiconductor System Engineering Center Toshiba Corp.
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Kawakyu Katsue
Toshiba Corp. Research And Development Center
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Kayano Hiroyuki
Toshiba Corporation
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Fukuyama Katsuya
Center For Liberal Arts Meiji Gakuin University
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Nishizawa Takashi
Inovative Research Initiatives Tokyo Institute Of Technology
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Inoue T
Ntt Docomo Chugoku Hiroshima‐shi Jpn
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Uematsu Kazuo
Research Institute Ishikawajima-harima Heavy Industries Co. Ltd.
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TAMURA Hideki
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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KIDOKORO Hideki
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Miyakawa Shin
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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ISHIKURA Takebumi
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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TSUNODA Katsunori
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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HASUO Hiroto
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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TAMARU Masanari
Center for Ceramics Research, Research Laboratory of Engineering Materials, Tokyo Institute of Techn
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Hasuo Hiroto
Center For Ceramics Research Research Laboratory Of Engineering Materials Tokyo Institute Of Technol
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Tamaru Masanari
Center For Ceramics Research Research Laboratory Of Engineering Materials Tokyo Institute Of Technol
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Nagakura Yasunori
Materials And Structures Laboratory Tokyo Institute Of Technology
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NAKAMURA Kazumasa
Department of Applied Chemistry, Faculty of Science and Engineering, Chuo University
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HATAKEYAMA Yoshikiyo
Graduate School of Science and Technology, Chiba University
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Miyakawa Shin
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Sasaki T
Opto And Wireless Deivce Res. Labs. Nec Corporation
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KANAIWA Takeshi
Department of Industrial Chemistry, Faculty of Science and Technology, Science University of Tokyo
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OKUMOTO Hajime
National Institute of Materials and Chemical Research
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SASANUMA Yuji
National Institute of Materials and Chemical Research
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Kanaiwa Takeshi
Department Of Industrial Chemistry Faculty Of Science And Technology Science University Of Tokyo
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Tanabe Yasuhiro
Department Of Cardiology Tokyo Metropolitan Hiroo General Hospital
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Hatakeyama Yoshikiyo
Graduate School Of Science And Technology Chiba University
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Nakamura Kazumasa
Department Of Applied Chemistry Faculty Of Science And Engineering Chuo University
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Ishikura Takebumi
Center For Ceramics Research Research Laboratory Of Engineering Materials Tokyo Institute Of Technol
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Tsunoda K
Department Of Applied Chemistry Faculty Of Science Science University Of Tokyo
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Wakimoto Hirotsugu
Research And Development Center Toshiba Corp.
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Tamura Hideki
Center For Ceramics Research Research Laboratory Of Engineering Materials Tokyo Institute Of Technol
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Kidokoro Hideki
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Seshita Toshiki
Research And Development Center Toshiba Corp.
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Obayashi S
Corporate R&d Center Toshiba Corp.
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Obayashi Shuichi
Toshiba Corporation
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Nishihori Kazuya
Research And Development Center Toshiba Corporation
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Sakurai Hideki
Department Of Chemistiy Faculty Of Science Tohoku University
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Sakurai Hideki
Department Of Industrial Chemistry Faculty Of Science And Technology Science University Of Tokyo
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Nagaoka Masami
Research and Development Center, Toshiba Corp.
著作論文
- A Monolithic GaAs Linear Power Amplifier Operating with a Single Low 2.7-V Supply for 1.9-GHz Digital Mobile Communication Applications
- Refractory WN_x/W Self-Aligned Gate GaAs Power Metal-Semiconductor Field-Effect Transistor for 1.9-GHz Digital Mobile Communication System Operating with a Single Low-Voltage Supply
- Single 3-V Supply Operation GaAs Linear Power MESFET Amplifier for 5.8-GHz ISM Band Applications (Special Issue on Microwave and Millimeter Wave Technology)
- A Buried-Channel Self-Aligned GaAs MESFET with High Power-Efficiency and Low Noise-Figure for 1.9-GHz Single-Chip Front-End MMICs (Special Issue on Low-Power and High-Speed LSI Technologies)
- A Buried-Channel WN_x/W Self-Aligned GaAs MESFET with High Power-Efficiency and Low Noise-Figure for Single-Chip Front-End MMIC in Personal Handy Phone System
- Buried-Channel WN_x/W Self-Aligned GaAs MESFET Process with Selectively Implanted Channel and Undoped Epitaxial Surface Layers for MMIC Applications
- Formation of Cubic Carbon by Dynamic Shock Compression of a Diamond/Amorphous Carbon Powder Mixture
- Carbon Phase Transition by Dynamic Shock Compression of a Copper/Graphite Powder Mixture
- Identification of Formation of Conically Converging Shock Waves in an Alumina-Sphere-Dispersed Copper Rod
- Anisotropic Heating of a Copper and Graphite Powder Mixture during an Electrical Column Explosion
- Characterization and Modification of Amorphous Carbon Films Consisting of sp^2 and sp^3 Bonds Using Magneto-Plasma Dynamic Arc-Jet
- Improvements in char yield and pore properties of wood-derived carbon by iodine treatment
- Synthesis and Mesomorphic Properties of 1, 10-Dialkylpermethyldecasilanes
- Liquid Crystalline Behavior of Linear Permethyloligosilanes
- Liquid Crystalline Oligosilanes with Alkoxybiphenyl Groups