S1302-1-6 レーザ直接描画装置を用いた高効率の大型回折光学素子の作製(超精密加工(1))

概要

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Recently, the demand to the diffractive optical elements is increasing with the developments in the micro fabrication technology. In this research, we created the diffractive optical elements with the use of the laser direct write lithography system that has the feature of high-resolution drawing, high-speed drawing, and a high accuracy positioning system. Although it is difficult to draw to a large-sized substrate with electron-beam lithography system, since the laser direct lithography system makes it possible, production of the large diffractive optical elements is expected. Furthermore, 2 and 4 levels phase-type diffraction optical elements were produced by dry etching processing to the substrate, and comparison of the diffraction efficiency of the amplitude-type diffractive optical element and the phase-type diffractive optical element. And the hologram was produced based on the diffraction efficiency of compared the diffractive optical elements.
社団法人日本機械学会の論文
2009-09-12