Chemical Treatment Effects of Si Surfaces in NH_4OH:H_2O_2:H_2O Solutions Studied by Spectroscopic Ellipsometry
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概要
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Chemically treated Si surfaces in 1NH_4OH:XH_2O_2:5H_2O (X=0 and 1) solutions at 80℃ have been studied using spectroscopic ellipsometry (SE). The SE data clearly indicate that the X=0 solution results in surface roughening while the X=1 solution, in surface chemical oxidation. It is found that chemical oxidation occurs immediately upon immersing the sample in the X=1 solution. The thickness of the oxide is also found to show a saturated value of 〜11Å against immersion time t.
- 社団法人応用物理学会の論文
- 1993-09-01
著者
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Adachi Sadao
Department Of Electronic Engineering Gunma University
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Utani Katsuyuki
Department Of Electronic Engineering Faculty Of Engineering Gunma University
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