Nucleation and Growth of Stress Relief Patterns in Sputtered Molybdenum Films
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概要
- 論文の詳細を見る
Stress relief patterns in sputtered molybdenum films were studied by Nomarski differential interference contrast microscope. As a result of the very large biaxial compressive stress in the film plane, ranging from E/16 to E/130 (where E is Young's modulus), the films were partially buckled and detached from the substrate, exhibiting one of two modes of stress relief pattern, wrinkled spots or wavy ridges. The former mode is a nucleation pattern and the latter a growth pat-tern. The transition between the two can be interpreted in terms of the stress intensity factor K_1 at the head of the gap formed due to stress between the film and the substrate. K_1 can be regarded as measure of the bond strength between the film and the substrate.
- 社団法人応用物理学会の論文
- 1986-05-20
著者
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Ogawa K
National Research Inst. Metals Tsukuba Jpn
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Takeuchi Tomoyuki
National Nesearch Institute For Metals
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Masumoto Tsuyoshi
The Research Development Corporation Of Japan:the Research Institute For Iron Steel And Other Metals
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OGAWA Keiichi
The Research Development Corporation of Japan
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OHKOSHI Tsuneo
National Research Institute for Metals
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MIZOGUCHI Tadashi
The Research Development Corporation of Japan
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Mizoguchi Tadashi
The Research Development Corporation Of Japan:department Of Physics Gakushuin University
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