Deposition of Heteroepitaxial In_2O_3 Thin Films by Molecular Beam Epitaxy
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-15
著者
-
重里 有三
青学大理工
-
MAEKAWA Mikako
Research Center, Asahi Glass Co., Ltd.
-
YASUI Itaru
Institute of Industrial Science, University of Tokyo
-
SHIGESATO Yuzo
College of Science and Engineering, Aoyama Gakuin University
-
TAGA Naoaki
Research Center Asahi Glass Co., Ltd.
-
KAKEI Masayuki
Institute of Industrial Science, University of Tokyo
-
HAYNES T.
Solid State Division, Oak Ridge National Laboratory
-
Yasui I
Univ. Tokyo Jpn
-
Yasui Itaru
Institute Of Industrial Science University Of Tokyo
-
重里 有三
青山学院大
-
Shigesato Yuzo
College Of Science And Engineering Aoyama Gakuin University
-
Shigesato Yuzo
Institute On Industrial Science University Of Tokyo
-
Haynes T
Solid State Division Oak Ridge National Laboratory
-
Taga N
Asahi Glass Co. Ltd. Yokohama Jpn
-
Taga Naoaki
Research Center Asahi Glass Co. Ltd.
-
Shigesato Yuzo
Department Of Chemistry Aoyama Gakuin University
-
Kamei M
National Inst. Materials Sci. (nims) Ibaraki Jpn
-
Kamei Masayuki
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
-
Kamei Masayuki
Institute Of Industrial Science University Of Tokyo
-
Kamei M
National Inst. Res. Inorganic Materials Ibaraki Jpn
-
Yasui Itaru
Institute On Industrial Science University Of Tokyo
-
Maekawa Mikako
Research Center Asahi Glass Co. Ltd.
-
Kakei Masayuki
Institute Of Industrial Science University Of Tokyo
-
Haynes T.
Solid State Division Oak Ridge National Laboratory
関連論文
- 3ω法によるIZO透明導電膜の熱伝導率測定
- SbドープSnO_2およびTaドープSnO_2薄膜の熱拡散率測定
- 薄膜熱物性データベースの開発(1) : 材料構造の階層性に対応したデータベース構造
- サーモリフレクタンス法を用いたAlq_3およびα-NPD薄膜の熱物性に関する研究
- DCマグネトロンスパッタ法により作製したAlドープZnO薄膜の熱拡散率測定
- サーモリフレクタンス法によるAZO薄膜の熱拡散率測定
- AlN、AlO_xN_y薄膜の熱物性に関する研究
- サーモリフレクタンス法によるTiN_x薄膜の熱拡散率の測定
- 透明導電膜の基礎と応用 (特集 エレクトロニック・フィールド)
- 可視光応答型光触媒WO_3多結晶体上に担持したPt島状構造の観察
- 酸化チタン光触媒薄膜の内部応力と光分解活性に関する研究
- H_2O添加スパッタリングで異なる基板上に作製した錫ドープ酸化インジウム(ITO)薄膜の構造と電気特性
- オゾン添加反応性直流マグネトロンスパッタによるITOの成膜
- AlドープZnO透明導電膜の反応性スパッタリングによる高速成膜
- ITO,IZO薄膜の作製方法と構造・物性
- スマートウインドウ : 賢い窓ガラス
- Thermochromic VO2 Films Deposited by RF Magnetron Sputtering Using V2O3 or V2O5 Targets
- Early stages of ITO deposition on polymer substrate
- オゾン添加反応性直流マグネトロンスパッタによるITOの成膜 (高機能性を有する無機薄膜材料)
- 研究プロジェクト概要 (高機能性を有する無機薄膜材料)
- 透明性を活かすためのコーティング
- スパッタ法による高性能性セラミックス薄膜の形成 (特集 コ-ティング)
- 透明導電膜の構造制御
- RFスパッタリングにより作製したサマリウム・アルミニウム含有シリカ薄膜の永続的スペクトルホールバーニング
- 透明導電膜としての酸化亜鉛 (特集 多様な電子機能をもつ酸化亜鉛の新展開)
- Effect of Sn Doping on the Crystal Growth of Indium Oxide Films
- Deposition of Heteroepitaxial In_2O_3 Thin Films by Molecular Beam Epitaxy
- Characterization of RF-Enhanced DC Sputtering to Deposit Tin-Doped Indium Oxide Thin Films
- 液晶およびそれ以外の表示素子用透明導電膜の限界と展望 (創刊17周年特集 透明導電膜のインパクト)
- 透明導電性セラミックス薄膜 - ITOの物性,成膜,用途
- 環境にやさしいスマ-トウインドウ--未来の窓ガラス
- 低比抵抗ITOの定温成膜
- 活性化蒸着法によるITO薄膜の表面モフォロジーに関する研究
- セラミックス計算機材料科学とその動向
- スパッタ法による高活性酸化チタン光触媒の成膜 (特集 酸化チタン光触媒の実用技術最前線) -- (光触媒膜作製技術)
- Preparation and Crystallization of Tin-doped and Undoped Amorphous Indium Oxide Films Deposited by Sputtering
- Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature
- Influence of Unbalanced Magnetron and Penning Ionization for RF Reactive Magnetron Sputtering
- Adsorption Site Determination by Reflection High-Energy Electron Diffraction Combined with Interface Energy Calculation
- Two Dimensional Structure and Growth Mode of Ultrathin Ce Film on a Mo(110) Surface
- Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron Sputtering
- Photocatalytic Property and Deep Levels of Nb-doped Anatase TiO_2 Film Grown by Metalorganic Chemical Vapor Depostion
- Comparative Study of TiO_2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition
- Deep Level Transient Spectroscopy Analysis of an Anatase Epitaxial Film Grown by Metal Organic Chemical Vapor Deposition : Surfaces, Interfaces, and Films
- Study on Electronic Structure and Optoelectronic Properties of Indium Oxide by First-Principles Calculations
- In Situ Observation of Adsorbed Heptylviologen Cation Radicals by Slab Optical Waveguide Spectroscopy Utilizing Indium-tin-oxide Electrode
- GaN Films Deposited by DC Reactive Magnetron Sputtering
- サーモリフレクタンス法を用いたAlq_3およびα-NPD薄膜の熱物性に関する研究(2)
- TiO_2およびNbドープTiO_2薄膜の熱拡散率測定
- Donor Compensation and Carrier-Transport Mechanisms in Tin-doped In_2O_3 Films Studied by Means of Conversion Electron ^Sn Mossbauer Spectroscopy and Hall Effect Measurements
- Doping Mechanisms of Sn in In_2O_3 Powder Studied Using ^Sn Mossbauer Spectroscopy and X-Ray Diffraction
- Al-Doped ZnO Films Deposited by Reactive Magnetron Sputtering in Mid-Frequency Mode with Dual Cathodes
- 3ω法によるIZO透明導電膜の熱伝導率測定(2)
- Crystallinity and Photocatalytic Activity of TiO_2 Films Deposited by Reactive Sputtering Using Various Magnetic Field Strengths
- Crystal Structure and Photocatalytic Activity of TiO_2 Films Deposited by Reactive Sputtering Using Ne, Ar, Kr, or Xe Gases
- Photoinduced Hydrophilicity of Epitaxially Grown TiO_2 Films by RF Magnetron Sputtering
- Study on Thermochromic VO_2 Films Grown on ZnO-Coated Glass Substrates for "Smart Windows"
- Crystallinity of Gallium-Doped Zinc Oxide Films Deposited by DC Magnetron Sputtering Using Ar, Ne or Kr Gas
- Electronic Structure Analyses of Sn-doped In_2O_3
- Electronic Polarization in Mixed Alkali Silicate Glasses: A Molecular Dynamics Study
- Structure Analysis of ZnO-TeO_2 Glasses by Means of Neutron Diffraction and Molecular Dynamics
- Oriented Tin-Doped Indium Oxide Films on Preferred Oriented Polycrystalline ZnO Films
- Microstructure of Low-Resistivity Tin-Doped Indium Oxide Films Deposited at 150〜200℃
- Effects of Tin Concentrations on Structural Characteristics and Electrooptical Properties of Tin-Doped Indiurm Oxide Films Prepared by RF Magnetron Sputtering
- Photocatalytic Properties of TiO_2 Films Deposited by Reactive Sputtering in Mid-Frequency Mode with Dual Cathodes
- Lattice Defects in O^+ Implanted Tin-Doped Indium Oxide Films
- Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
- Risk evaluation with waste scenario : lead emissions in solder waste treatment
- In Situ X-Ray Chemical Analysis of Y_1Ba_2Cu_3O_ Films by Reflection-High-Energy-Electron-Diffraction Total-Reflection-Angle X-Ray Spectroscopy
- X-Ray Chemical Analysis of an YBa_2Cu_3O_x Thin Film by Scanning Electron Microscopy and Total-Reflection-Angle X-Ray Spectroscopy (SEM-TRAXS)
- Novel Chemical Analysis for Thin Films: Scanning Electron Microscopy & Total-Reflection-Angle X-Ray Spectroscopy (SEM-TRAXS)-X-Ray Take-Off Angle Effect
- NbドープTiO_2薄膜の熱拡散率に対するNb添加効果
- Thermochromic VO_2 Films Deposited by RF Magnetron Sputtering Using V_2O_3 or V_2O_5 Targets
- Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
- Photocatalytic Property and Deep Levels of Nb-doped Anatase TiO2 Film Grown by Metalorganic Chemical Vapor Depostion
- GaN Films Deposited by DC Reactive Magnetron Sputtering
- Deposition of Heteroepitaxial In2O3 Thin Films by Molecular Beam Epitaxy
- Characterization of RF-Enhanced DC Sputtering to Deposit Tin-Doped Indium Oxide Thin Films
- 25pWA-4 VO_2薄膜の光電子分光(25pWA その他(光電子分光,薄膜,電界効果など),領域8(強相関系分野-高温超伝導,強相関f電子系など))