Photocatalytic Property and Deep Levels of Nb-doped Anatase TiO2 Film Grown by Metalorganic Chemical Vapor Depostion
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概要
- 論文の詳細を見る
A Nb-doped anatase TiO2 (Nb: 5 at%) film was grown on a SrTiO3(001) substrate by metalorganic chemical vapor deposition. Deep level transient spectroscopy analysis revealed that this film possessed two kinds of deep levels due to the Nb ions, which were found to exist at 0.32 eV and 0.67 eV below the bottom of the conduction band. The photocatalytic activity of this film was low compared with that of the undoped anatase film, suggesting that the deep levels acted as recombination centers of photoexcited electron-hole pairs.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2004-02-15
著者
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Kamei Masayuki
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
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Yamazaki Atsushi
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
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MITSUHASHI Takefumi
Advanced Materials Laboratory (AML), National Institute for Materials Science (NIMS)
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Miyagi Takahira
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
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Sakaguchi Isao
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
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Mitsuhashi Takefumi
Advanced Materials Laboratory (AML), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Sakaguchi Isao
Advanced Materials Laboratory (AML), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Miyagi Takahira
Advanced Materials Laboratory (AML), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Yamazaki Atsushi
Advanced Materials Laboratory (AML), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Sakaguchi Isao
Advanced Material Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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