Influence of Unbalanced Magnetron and Penning Ionization for RF Reactive Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-01-15
著者
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重里 有三
青学大理工
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KAMEI Masayuki
Institute of Industrial Science, University of Tokyo
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YASUI Itaru
Institute of Industrial Science, University of Tokyo
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Yasui I
Univ. Tokyo Jpn
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Yasui Itaru
Institute Of Industrial Science University Of Tokyo
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重里 有三
青山学院大
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Shigesato Yuzo
Institute Of Industrial Science University Of Tokyo
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Shigesato Yuzo
Institute On Industrial Science University Of Tokyo
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Shigesato Yuzo
Department of Chemistry, College of Science and Engineering, Aoyama University
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MIYAZAKI Hidetoshi
Institute of Industrial Science, University of Tokyo
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Shigesato Yuzo
Department Of Chemistry Aoyama Gakuin University
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Kamei M
National Inst. Materials Sci. (nims) Ibaraki Jpn
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Kamei Masayuki
Advanced Materials Laboratory (aml) National Institute For Materials Science (nims)
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Kamei Masayuki
Institute Of Industrial Science University Of Tokyo
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Kamei M
National Inst. Res. Inorganic Materials Ibaraki Jpn
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Miyazaki Hidetoshi
Institute For Materials Research Tohoku University
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Miyazaki Hidetoshi
Institute Of Industrial Science University Of Tokyo
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Yasui Itaru
Institute On Industrial Science University Of Tokyo
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