Deposition of Heteroepitaxial In2O3 Thin Films by Molecular Beam Epitaxy

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概要

• 論文の詳細を見る
• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1999-03-15

著者

• Yasui Itaru

  Institute Of Industrial Science University Of Tokyo

• Shigesato Yuzo

  College Of Science And Engineering Aoyama Gakuin University

• Maekawa Mikako

  Research Center Asahi Glass Co. Ltd.

• Kakei Masayuki

  Institute Of Industrial Science University Of Tokyo

• Haynes T.

  Solid State Division Oak Ridge National Laboratory

• Taga by

  Research Center, Asahi Glass Co., Ltd., Kanagawa-ku, Yokohama 221-8755, Japan

• Haynes T.

  Solid State Division, Oak Ridge National Laboratory, 2008, Oak Ridge, TN 37831, U.S.A.

• Kakei Masayuki

  Institute of Industrial Science, University of Tokyo, 7-22-1, Minato-ku, Tokyo 106-8558, Japan

• Maekawa Mikako

  Research Center, Asahi Glass Co., Ltd., Kanagawa-ku, Yokohama 221-8755, Japan

関連論文

• Effect of Sn Doping on the Crystal Growth of Indium Oxide Films
• Deposition of Heteroepitaxial In_2O_3 Thin Films by Molecular Beam Epitaxy
• Characterization of RF-Enhanced DC Sputtering to Deposit Tin-Doped Indium Oxide Thin Films
• Preparation and Crystallization of Tin-doped and Undoped Amorphous Indium Oxide Films Deposited by Sputtering
• Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature
• Influence of Unbalanced Magnetron and Penning Ionization for RF Reactive Magnetron Sputtering
• Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron Sputtering
• Study on Electronic Structure and Optoelectronic Properties of Indium Oxide by First-Principles Calculations
• In Situ Observation of Adsorbed Heptylviologen Cation Radicals by Slab Optical Waveguide Spectroscopy Utilizing Indium-tin-oxide Electrode
• Donor Compensation and Carrier-Transport Mechanisms in Tin-doped In_2O_3 Films Studied by Means of Conversion Electron ^Sn Mossbauer Spectroscopy and Hall Effect Measurements
• Doping Mechanisms of Sn in In_2O_3 Powder Studied Using ^Sn Mossbauer Spectroscopy and X-Ray Diffraction
• Al-Doped ZnO Films Deposited by Reactive Magnetron Sputtering in Mid-Frequency Mode with Dual Cathodes
• Electronic Structure Analyses of Sn-doped In_2O_3
• Electronic Polarization in Mixed Alkali Silicate Glasses: A Molecular Dynamics Study
• Structure Analysis of ZnO-TeO_2 Glasses by Means of Neutron Diffraction and Molecular Dynamics
• Oriented Tin-Doped Indium Oxide Films on Preferred Oriented Polycrystalline ZnO Films
• Microstructure of Low-Resistivity Tin-Doped Indium Oxide Films Deposited at 150〜200℃
• Effects of Tin Concentrations on Structural Characteristics and Electrooptical Properties of Tin-Doped Indiurm Oxide Films Prepared by RF Magnetron Sputtering
• Lattice Defects in O^+ Implanted Tin-Doped Indium Oxide Films
• Risk evaluation with waste scenario : lead emissions in solder waste treatment
• Thermochromic VO_2 Films Deposited by RF Magnetron Sputtering Using V_2O_3 or V_2O_5 Targets
• Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
• GaN Films Deposited by DC Reactive Magnetron Sputtering
• Deposition of Heteroepitaxial In2O3 Thin Films by Molecular Beam Epitaxy
• Characterization of RF-Enhanced DC Sputtering to Deposit Tin-Doped Indium Oxide Thin Films

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