Microstructure of Low-Resistivity Tin-Doped Indium Oxide Films Deposited at 150〜200℃
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-15
著者
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重里 有三
青学大理工
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YASUI Itaru
Institute of Industrial Science, University of Tokyo
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Yasui I
Univ. Tokyo Jpn
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Yasui Itaru
Institute Of Industrial Science University Of Tokyo
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Shigesato Yuzo
Institute Of Industrial Science University Of Tokyo
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Shigesato Yuzo
Institute On Industrial Science University Of Tokyo
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TAKAKI Satoru
Research Institute of Electrical Communical,Tohoku University
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Yasui Itaru
Institute On Industrial Science University Of Tokyo
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Yi Choong
Institute Of Industrial Science University Of Tokyo
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Takaki Satoru
Research Center Asahi Glass Co. Ltd.
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Takaki Satoru
Research Center Asahi Glass Cooperation Ltd.
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