Fabrication of Indium Tin Oxide Whiskers by Sputtering

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Whisker crystals and whisker structures have many possibilities for industrial applications because of their unique shape with high aspect ratios. However, their fabrication methods need a high-temperature process and a limited substrate, thereby limiting their applications. Therefore, a new fabrication method that can prepare whiskers at low cost and directly on a versatile substrate, such as a glass substrate, is required. We found that indium tin oxide coatings with well-developed whisker structures could be prepared on glass substrates heated at 300 °C using conventional DC magnetron sputtering. These whisker coatings consist of continuous underlayer and upper structures with many whiskers. Each whisker is 500 nm to 1 μm in length and 10 to 20 nm in diameter. We revealed that the whisker structures were well grown under low-oxygen sputtering conditions and these whisker coatings could be categorized into three types of whisker morphology by scanning electron microscopy (SEM) observation and X-ray diffraction analysis (XRD). Whisker coatings of the first type have many needle structures and are strongly oriented along the $ \langle 222 \rangle $ axis normal to the substrate. Whisker coating of the second type are increasingly oriented along the $ \langle 400 \rangle $ axis and show a structure consisting of many trunks with side branches like similar to fir tree. Whisker coatings of the last type are equally oriented along $ \langle 222 \rangle $ and $ \langle 400 \rangle $ axes and have many fish-bone-like whisker structures. These whisker coatings may offer many possibilities for industrial applications, for example, emitter material for field-emission displays, and surface structures for super-hydrophilic or super-hydrophobic surfaces.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2006-04-15

Fabrication of Indium Tin Oxide Whiskers by Sputtering

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