Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-01-15
著者
-
SHIGESATO Yuzo
College of Science and Engineering, Aoyama Gakuin University
-
Song Pung
College Of Science And Engineering Aoyama Gakuin University
-
Kon Masato
College Of Science And Engineering Aoyama Gakuin University
-
SUZUKI Koichi
SurfTech Transnational Co., Ltd.
-
Ohno Shingo
Research & Development Division
-
FRACH Peter
Fraunhofer Institut Elektronenstrahl-und Plasmatechnik
関連論文
- サーモリフレクタンス法によるTiN_x薄膜の熱拡散率の測定
- 透明導電膜の基礎と応用 (特集 エレクトロニック・フィールド)
- AlドープZnO透明導電膜の反応性スパッタリングによる高速成膜
- ITO,IZO薄膜の作製方法と構造・物性
- スマートウインドウ : 賢い窓ガラス
- Thermochromic VO2 Films Deposited by RF Magnetron Sputtering Using V2O3 or V2O5 Targets
- Early stages of ITO deposition on polymer substrate
- オゾン添加反応性直流マグネトロンスパッタによるITOの成膜 (高機能性を有する無機薄膜材料)
- 研究プロジェクト概要 (高機能性を有する無機薄膜材料)
- 透明性を活かすためのコーティング
- スパッタ法による高性能性セラミックス薄膜の形成 (特集 コ-ティング)
- 透明導電膜の構造制御
- 透明導電膜としての酸化亜鉛 (特集 多様な電子機能をもつ酸化亜鉛の新展開)
- Effect of Sn Doping on the Crystal Growth of Indium Oxide Films
- Deposition of Heteroepitaxial In_2O_3 Thin Films by Molecular Beam Epitaxy
- Characterization of RF-Enhanced DC Sputtering to Deposit Tin-Doped Indium Oxide Thin Films
- スパッタ法による高活性酸化チタン光触媒の成膜 (特集 酸化チタン光触媒の実用技術最前線) -- (光触媒膜作製技術)
- Preparation and Crystallization of Tin-doped and Undoped Amorphous Indium Oxide Films Deposited by Sputtering
- Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature
- Study on Electronic Structure and Optoelectronic Properties of Indium Oxide by First-Principles Calculations
- In Situ Observation of Adsorbed Heptylviologen Cation Radicals by Slab Optical Waveguide Spectroscopy Utilizing Indium-tin-oxide Electrode
- GaN Films Deposited by DC Reactive Magnetron Sputtering
- Donor Compensation and Carrier-Transport Mechanisms in Tin-doped In_2O_3 Films Studied by Means of Conversion Electron ^Sn Mossbauer Spectroscopy and Hall Effect Measurements
- Doping Mechanisms of Sn in In_2O_3 Powder Studied Using ^Sn Mossbauer Spectroscopy and X-Ray Diffraction
- Al-Doped ZnO Films Deposited by Reactive Magnetron Sputtering in Mid-Frequency Mode with Dual Cathodes
- Crystallinity of Gallium-Doped Zinc Oxide Films Deposited by DC Magnetron Sputtering Using Ar, Ne or Kr Gas
- Electronic Structure Analyses of Sn-doped In_2O_3
- Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
- High Rate Reactive Sputter Deposition of TiO2 Films for Photocatalyst and Dye-Sensitized Solar Cells
- Thermochromic VO_2 Films Deposited by RF Magnetron Sputtering Using V_2O_3 or V_2O_5 Targets
- Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
- GaN Films Deposited by DC Reactive Magnetron Sputtering