Structural Study of Amorphous SiN_x:H Films Produced by Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-05-15
著者
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Nakayama Yoshikazu
Department Of Electrical Engineering College Of Engineering University Of Osaka
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Wakita Kazuki
Department Of Physics And Electronics College Of Engineering Osaka Prefecture University
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Wakita Kazuki
Department Of Mathematical Science University Of Osaka Prefecture
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Hayashi Hideki
Department Of Clinical Pharmacology & Genetics School Of Pharmaceutical Sciences University Of S
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Hayashi Hideki
Department Of Cardiovascular And Respiratory Medicine Shiga University Of Medical Science
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Hayashi Hideki
Department Of Biopharmacy School Of Pharmaceutical Sciences University Of Shizuoka
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Hayashi Hideki
Department Of Physics And Electronics College Of Engineering Osaka Prefecture University
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Hayashi Hideki
Department Of Academic Surgery Chiba University Graduate School Of Medicine
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Wakita Kazuki
Department of Electrical, Electronics and Computer Engineering, Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino, Chiba 275-0016, Japan
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Hayashi Hideki
Department Clinical Pharmacology & Genetics, School of Pharmaceutical Sciences, University of Shizuoka
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