四極子型質量分析計による低エネルギー二次イオン分析法の表面スパッタリング特性とオージェ電子分光法との比較

概要

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A secondary ion mass spectrometer(SIMS) with a quadrupole mass analyscr and a low energy ion ization gun has been developed and applied to the investigation of the sputtering behavior on alloys with various compositions were used as samples, which were with abrasing paper and ultrasonically cleaned by acetone prior to the measurements. The copper-nickel alloy samples were sputtered by argon ions with energy of 1.5 keV, ionic current of 0.4μA and 23×16 mm oval spot at 5×10^<-5> Torr. Nickel peak was initially detected higher than those expected from the bulk composition and then decreased gradually to a constant value of Ni/Cu. The behavior of SIMS signals(time variation of the peak height) were almost the same as those obtained by Auger electron spectrometry(AES), although the signals of copper and nickel show the inverse behavior in SIMS and AES. This fact suggests that SIMS signals give information on the composition of the sputtered ions from the surface, while AES signals give those of the inner matrix.
社団法人日本分析化学会の論文
1977-04-05