炭素源溶液に水を混合して堆積したダイヤモンド薄膜の結晶性

概要

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CVD (Chemical Vapor Deposition)diamond thin films have been fabricated with water mixed carbon solution. Undoped and Boron doped diamond thin films were deposited on p-type Silicon and single crystal diamond (type Ib) substrate by hot-filament CVD method. It was confirmed that the resistance of diamond films, which were deposited with intentional water including carbon solution, was higher than that of as-grown diamond without intentional water. From the measurement of Seebeck effect, p type conduction did not be obtained in such diamonds. The crystallinity of water added diamond thin films were evaluated by using Raman spectroscopy, XPS (X-Ray Photoelectron Spectroscopy) and SIMS (Secondary Ion Mass Spectrometry). From these results, it was found that the intentionally mixed water acted as an effect for good quality to undoped diamond thin films.
東海大学の論文