Plasma Deposition of HfO_2 and TiO_2 onto Plasma-Nitrided Ge Surfaces
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
-
Lee Sanghyun
Department Of Applied Plant Science Chung-ang University
-
Lee Sanghyun
Department Of Physics North Carolina State University
-
Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
-
LONG Joseph
Department of Physics, North Carolina State University
-
LUNING Jan.
Stanford Synchrotron Radiation Laboratory (SSRL)
-
Long Joseph
Department Of Physics North Carolina State University
関連論文
- Aldose Reductase Inhibitory Compounds from Glycyrrhiza uralensis
- Inhibition of Aldose Reductase by Phenylethanoid Glycoside Isolated from the Seeds of Paulownia coreana
- Protective Effect of (4-Methoxybenzylidene)-(3-methoxynophenyl)amine against Neuronal Cell Death Induced by Oxygen and Glucose Deprivation in Rat Organotypic Hippocampal Slice Culture(Medicinal Chemistry)
- Protein Glycation Inhibitors from the Fruiting Body of Phellinus linteus(Pharmacognosy)
- Inhibitory Effects of Isorhamnetin-3-O-β-D-glucoside from Salicornia herbacea on Rat Lens Aldose Reductase and Sorbitol Accumulation in Streptozotocin-Induced Diabetic Rat Tissues(Pharmacognosy)
- The mechanism of anti-inflammatory activity of 2'-hydroxychalcone derivatives
- Chemical Bonding at Interfaces between Si (100) and High-K Dielectrics : Competing Effects of i) Process Gas-Substrate and ii) Film Deposition Reactions
- A Unified Chemical Bonding Model for Defect Generation in a-SiH: Photo-Induced Defects in Photovoltaic Devices and Current-Induced Defects in TFTs.
- Aldose Reductase Inhibitors from the Fruiting Bodies of Ganoderma applanatum(Pharmacognosy)
- Geniposide from Gardenia jasminoides Attenuates Neuronal Cell Death in Oxygen and Glucose Deprivation-Exposed Rat Hippocampal Slice Culture(Pharmacognosy)
- Anti-obesity Effect of Pinellia ternata Extract in Zucker Rats(Pharmacognosy)
- Characterization of the Interface between Plasma-Oxidized SiO_2 and Crystalline Silicon by Cathodoluminescence Spectroscopy (CLS)
- Monolayer Nitrogen-Atom Distributions in Ultrathin Gate Dielectrics by Low-Temperature Low-Thermal-Budget Processing
- Integration of Plasma-Assisted and Rapid Thermal Processing for Low-Thermal Budget Preparation of Ultra-Thin Dielectrics for Stacked-Gate Device Structures
- Many-Electron Multiplet Theory Applied to O-Atom Vacancies in High-$\kappa$ Dielectrics
- Controlled Nitrogen Incorporation at Si-SiO_2 Interfaces by Remote Plasma-Assisted Processing
- Plasma Deposition of HfO_2 and TiO_2 onto Plasma-Nitrided Ge Surfaces
- Effect of F1ying Time and Aircraft Types on the Hearing of Korean Air Force Pilots (日本人間工学会第43回講演集) -- (The Joint Symposium on Ergonomics(JES/ESK))
- A Unified Model for Charge Defect Generation in a-SiH : Photo-Induced Defects in Photovoltaic (PV) Devices and Current Induced Defects in Thin Film Transistors (TFTs)
- Differences between the Electrical Properties of Nitrided Si-SiO_2 Interfaces Formed by (a) Post-Oxidation, Remote Plasma-Assisted Nitridation and (b) Remote Plasma-Assisted Deposition
- Detection of multivalency charge states in complex and elemental transition metal oxides by X-ray absorption spectroscopy: controlled multivalency as a pathway to device functionality (Special issue: Dielectric thin films for future electron devices: scie
- Local Atomic Bonding in Fluorinated Silicon Oxides: Bond-Ionicity-Controlled Contributions of Infrared-Active Vibrations to the Static Dielectric Constant
- Intrinsic Limitations on Ultimate Device Performance and Reliability from Transition Regions at i) Si-Dielectric Interfaces and ii) Internal Interfaces
- Jumping of a droplet on a superhydrophobic surface in AC electrowetting
- Ultrathin Nitride/Oxide (N/O) Gate Dielectrics for p^+-poly Gated PMOSFETs Prepared by a Combined Remote Plasma Enhanced CVD/Thermal Oxidation Process
- Sesquiterpenes and Other Constituents from Dendranthema zawadskii var. latilobum
- Band-Edge Electronic Structure and Pre-existing Defects in Remote Plasma Deposited Non-crystalline SiO
- Band-Edge Electronic Structure and Pre-existing Defects in Remote Plasma Deposited Non-crystalline SiO₂ and GeO₂ (Special Issue : Solid State Devices and Materials)