Chemical Bonding at Interfaces between Si (100) and High-K Dielectrics : Competing Effects of i) Process Gas-Substrate and ii) Film Deposition Reactions
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概要
- 論文の詳細を見る
- 2000-08-28
著者
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HONG Joon
Department of Plastic and Reconstructive Surgery, University of Ulsan College of Medicine, Asan Medi
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Hong Joon
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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LUCOVSKY Gerald
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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NIIMI Hiro
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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JOHNSON Robert
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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THERRIEN Robert
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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RAYNER Bruce
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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Niimi Hiro
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Niimi Hiro
Department Of Physics North Carolina State University
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Rayner Bruce
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Johnson Robert
Department Of Physics University Of Pennsylvania
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Johnson Robert
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Therrien Robert
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
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Lucovsky Gerald
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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