Differences between the Electrical Properties of Nitrided Si-SiO_2 Interfaces Formed by (a) Post-Oxidation, Remote Plasma-Assisted Nitridation and (b) Remote Plasma-Assisted Deposition
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Niimi Hiro
Department Of Physics North Carolina State University
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Niimi Hiro
Departments Of Materials Science And Engineering North Carolina State University
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Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
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Lucovsky Gerald
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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WU Yider
Departments of Electrical and Computer Engineering, North Carolina State University
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Wu Yider
Departments Of Electrical And Computer Engineering North Carolina State University
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NIIMI Hiro
Departments of Materials Science and Engineering, North Carolina State University
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- Differences between the Electrical Properties of Nitrided Si-SiO_2 Interfaces Formed by (a) Post-Oxidation, Remote Plasma-Assisted Nitridation and (b) Remote Plasma-Assisted Deposition
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