Niimi Hiro | Department Of Physics North Carolina State University
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概要
関連著者
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Niimi Hiro
Department Of Physics North Carolina State University
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Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
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LUCOVSKY Gerald
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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NIIMI Hiro
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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Niimi H
Hokkaido Univ. Sapporo Jpn
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Lucovsky G
Departments Of Physics And Electrical And Computer Engineering North Carolina State University
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HONG Joon
Department of Plastic and Reconstructive Surgery, University of Ulsan College of Medicine, Asan Medi
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Parker Chris
Department Of Electrical And Computer Engineering North Carolina State University
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Hattangady Sunil
Department Of Materials Science And Engineering North Carolina State University
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Hong Joon
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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JOHNSON Robert
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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THERRIEN Robert
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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RAYNER Bruce
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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Lee David
Department Of Materials Science And Engineering North Carolina State University
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Hauser John
Department Of Electrical And Computer Engineering North Carolina State University
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Niimi Hiro
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Niimi Hiro
Departments Of Materials Science And Engineering North Carolina State University
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Komine Kenji
Advanced Technology Research Laboratory Meidensha Corporation
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Rayner Bruce
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Johnson Robert
Department Of Physics University Of Pennsylvania
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Johnson Robert
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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SCHAFER Joerg
Department of Electrical Engineering, Ohio State University
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YOUNG Alex
Department of Electrical Engineering, Ohio State University
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BRILLSON Leonard
Department of Electrical Engineering, Ohio State University
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JING Ze
Department of Physics, North Carolina State University
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Jing Ze
Department Of Physics North Carolina State University
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KOH Kwangok
Departments of Materials Science and Engineering North Carolina State University
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GREEN Martin
Lucent Bell Laboratories, Murray Hill
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Therrien Robert
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Young Alex
Department Of Electrical Engineering Ohio State University
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Schafer Joerg
Department Of Electrical Engineering Ohio State University
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Lucovsky Gerald
Department Of Physics North Carolina State University
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Green Martin
Lucent Bell Laboratories Murray Hill
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Lucovsky Gerald
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Lucovsky Gerald
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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WU Yider
Departments of Electrical and Computer Engineering, North Carolina State University
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Brillson Leonard
Department Of Electrical Engineering Ohio State University
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Wu Yider
Departments Of Electrical And Computer Engineering North Carolina State University
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Lee David
Department Of Biological Science Florida International University
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NIIMI Hiro
Departments of Materials Science and Engineering, North Carolina State University
著作論文
- Chemical Bonding at Interfaces between Si (100) and High-K Dielectrics : Competing Effects of i) Process Gas-Substrate and ii) Film Deposition Reactions
- Characterization of the Interface between Plasma-Oxidized SiO_2 and Crystalline Silicon by Cathodoluminescence Spectroscopy (CLS)
- Monolayer Nitrogen-Atom Distributions in Ultrathin Gate Dielectrics by Low-Temperature Low-Thermal-Budget Processing
- Controlled Nitrogen Incorporation at Si-SiO_2 Interfaces by Remote Plasma-Assisted Processing
- Differences between the Electrical Properties of Nitrided Si-SiO_2 Interfaces Formed by (a) Post-Oxidation, Remote Plasma-Assisted Nitridation and (b) Remote Plasma-Assisted Deposition