LUCOVSKY Gerald | Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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概要
- 同名の論文著者
- Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering, の論文著者
関連著者
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LUCOVSKY Gerald
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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Lucovsky Gerald
Department Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nort
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Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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Lucovsky G
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Hattangady Sunil
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Lee David
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Niimi H
Hokkaido Univ. Sapporo Jpn
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JING Ze
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Jing Ze
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Ma Yi
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HONG Joon
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Parker Chris
Department Of Electrical And Computer Engineering North Carolina State University
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YANG Hong
Department of Pathology, Xuanwu Hospital, Capital University of Medical Sciences
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Yang H
Kwangju Inst. Sci. And Technol. Kwangju Kor
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Yang Hong
Microelectronics Centre School Of Electrical And Electronics Engineering Nanyang Technological Unive
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Hong Joon
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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JOHNSON Robert
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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THERRIEN Robert
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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RAYNER Bruce
Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering,
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Yang Hong
Department Of Information Engineering Xidian University
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Hauser John
Department Of Electrical And Computer Engineering North Carolina State University
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Niimi Hiro
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Whitten Jerry
Department Of Chemistry North Carolina State University
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Komine Kenji
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Johnson Robert
Department Of Physics University Of Pennsylvania
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Johnson Robert
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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SCHAFER Joerg
Department of Electrical Engineering, Ohio State University
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YOUNG Alex
Department of Electrical Engineering, Ohio State University
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BRILLSON Leonard
Department of Electrical Engineering, Ohio State University
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Wortman Jimmie
Department Of Physics North Carolina State University
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LU Zhong
Department of Physics, North Carolina State University
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MISRA Veena
Department of Electrical and Computer Engineering, North Carolina State University
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Lu Zhong
Department Of Physics North Carolina State University
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Misra Veena
Department Of Electrical And Computer Engineering North Carolina State University
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KOH Kwangok
Departments of Materials Science and Engineering North Carolina State University
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GREEN Martin
Lucent Bell Laboratories, Murray Hill
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Therrien Robert
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Young Alex
Department Of Electrical Engineering Ohio State University
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Schafer Joerg
Department Of Electrical Engineering Ohio State University
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Lucovsky Gerald
Department Of Physics North Carolina State University
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Green Martin
Lucent Bell Laboratories Murray Hill
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Lucovsky Gerald
Departments Of Physics Materials Science And Engineering And Electrical And Computer Engineering Nor
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Brillson Leonard
Department Of Electrical Engineering Ohio State University
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Yang Hong
Department Of Chemistry North Carolina State University
著作論文
- Chemical Bonding at Interfaces between Si (100) and High-K Dielectrics : Competing Effects of i) Process Gas-Substrate and ii) Film Deposition Reactions
- A Unified Chemical Bonding Model for Defect Generation in a-SiH: Photo-Induced Defects in Photovoltaic Devices and Current-Induced Defects in TFTs.
- Characterization of the Interface between Plasma-Oxidized SiO_2 and Crystalline Silicon by Cathodoluminescence Spectroscopy (CLS)
- Monolayer Nitrogen-Atom Distributions in Ultrathin Gate Dielectrics by Low-Temperature Low-Thermal-Budget Processing
- Integration of Plasma-Assisted and Rapid Thermal Processing for Low-Thermal Budget Preparation of Ultra-Thin Dielectrics for Stacked-Gate Device Structures
- Controlled Nitrogen Incorporation at Si-SiO_2 Interfaces by Remote Plasma-Assisted Processing